公开(公告)号：US20190235392A1

公开(公告)日：2019-08-01

申请号：US16318191

申请日：2017-06-29

申请人： ASML NETHERLANDS B.V.

发明人： Andre Bernardus JEUNINK ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Stan Henricus VAN DER MEULEN ,  Yang-Shan HUANG ,  Federico LA TORRE ,  Barry MOEST ,  Stefan Carolus Jacobus Antonius KEIJ ,  Enno VAN DEN BRINK ,  Christine Henriette SCHOUTEN ,  Hoite Pieter Theodoor TOLSMA

IPC分类号： G03F7/20 ,  G03F1/64

摘要： A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.