公开(公告)号：US20240077803A1

公开(公告)日：2024-03-07

申请号：US18273618

申请日：2021-12-30

Applicant: ASML NETHERLANDS B.V. ,  ASML Holding N.V.

Inventor： Laurentius Johannes Adrianus VAN BOKHOVEN ,  Mahesh Upendra AJGAONKAR

IPC: G03F7/00

CPC classification number: G03F7/702 ,  G03F7/70166 ,  G03F7/70208 ,  G03F7/70891

Abstract: Systems, apparatuses, and methods are provided for heating a plurality of optical components. An example method can include receiving an input radiation beam from a radiation source. The example method can further include generating a plurality of output radiation beams based on the input radiation beam. The example method can further include transmitting the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of optical components. Optionally, the example method can further include controlling a respective power value, and realizing a flat-top far-field profile, of each of the plurality of output radiation beams.

公开(公告)号：US20150355557A1

公开(公告)日：2015-12-10

申请号：US14762450

申请日：2014-02-20

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Koen CUYPERS ,  Marcelo Henrique DE ANDRADE OLIVEIRA ,  Marinus Jan REMIE ,  Chattarbir SINGH ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Henricus Anita Jozef Wilhemus VAN DE VEN ,  José Nilton FONSECA JUNIOR ,  Frank Johannes Jacobus VAN BOXTEL ,  Daniel Nathan BURBANK ,  Erik Roelof LOOPSTRA ,  Johannes ONVLEE ,  Mark Josef SCHUSTER ,  Robertus Nicodemus Jacobus VAN BALLEGOIJ ,  Christopher Charles WARD ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70358 ,  G03F7/70633 ,  G03F7/70725 ,  G03F7/70866

Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

Abstract translation: 公开了一种通过控制光刻设备的图案形成装置周围的气流来减少重叠误差的系统。 光刻设备包括被配置为调节辐射束的照明系统。 光刻设备还包括可移动台，其包括可构造成支撑图案形成装置的支撑结构。 图案形成装置可以被配置为在其横截面中赋予辐射束图案以形成图案化的辐射束。 此外，光刻设备包括位于可移动台（401）和投影系统（208）之间的板（410）。 板包括包括第一侧壁（411a）和第二侧壁（411b）的开口（411）。 板可以被配置为在基本上垂直于照明系统的光轴的可移动台和投影系统之间的区域中提供气流图案（424）。

公开(公告)号：US20200174381A1

公开(公告)日：2020-06-04

申请号：US16615810

申请日：2018-04-18

Applicant: ASML Netherlands B.V.

Inventor： Jean-Philippe Xavier VAN DAMME ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Petrus Franciscus VAN GILS ,  Gerben PIETERSE

IPC: G03F7/20

Abstract: The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.

公开(公告)号：US20180356740A1

公开(公告)日：2018-12-13

申请号：US16061043

申请日：2016-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Laurentius Johannes Adrianus VAN BOKHOVEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Günes NAKIBOGLU ,  Marinus Jan REMIE ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70933

Abstract: An apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across the patterning device. A patterning apparatus includes: a patterning device support structure configured to support a patterning device; a patterning device conditioning system including a first gas outlet configured to provide a gas flow over a surface of the patterning device and a second gas outlet configured to provide a gas flow over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system configured to separately control the temperature of the gas exiting the first and second gas outlets such that the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet and/or to separately control the temperature and gas flow rate of the gas exiting the first and second gas outlets.

公开(公告)号：US20210389676A1

公开(公告)日：2021-12-16

申请号：US17279648

申请日：2019-09-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Bearrach MOEST ,  Rowin MEIJERINK ,  Thijs SCHENKELAARS ,  Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Laurentius Johannes Adrianus VAN BOKHOVEN

IPC: G03F7/20

Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.

公开(公告)号：US20190235392A1

公开(公告)日：2019-08-01

申请号：US16318191

申请日：2017-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Stan Henricus VAN DER MEULEN ,  Yang-Shan HUANG ,  Federico LA TORRE ,  Barry MOEST ,  Stefan Carolus Jacobus Antonius KEIJ ,  Enno VAN DEN BRINK ,  Christine Henriette SCHOUTEN ,  Hoite Pieter Theodoor TOLSMA

IPC: G03F7/20 ,  G03F1/64

Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.

公开(公告)号：US20160349631A1

公开(公告)日：2016-12-01

申请号：US15116794

申请日：2015-01-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes NAKIBOGLU ,  Martijn VAN BAREN ,  Frank Johannes Jacobs VAN BOXTEL ,  Koen CUYPERS ,  Jeroen Gerard GOSEN ,  Laurentius Johannes Adrianus VAN BOKHOVEN

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70908

Abstract: A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.

Abstract translation: 包括屏障系统的光刻设备和使用这种光刻设备的设备制造方法。 屏障系统用于将受保护的气体体积维持在屏障内。 当光刻设备的不同部件相对于彼此移动时，可以保持受保护的体积。 屏障系统可用于光刻设备内的不同位置。 屏障的几何形状会影响保护体积的保持程度，尤其是在高速度下。 几何形状减少了从屏障外部进入受保护体积的环境气体的量。

公开(公告)号：US20230400785A1

公开(公告)日：2023-12-14

申请号：US18251261

申请日：2021-10-14

Applicant: ASML Netherlands B.V.

Inventor： Antonius Johannus VAN DER NET ,  Martinus Cornelis Maria VERHAGEN ,  Johannes Henricus Wilhelmus JACOBS ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Jeroen Peterus Johannes VAN LIPZIG

IPC: G03F7/00

CPC classification number: G03F7/70891

Abstract: There is provided a conditioning system for a lithographic apparatus, said conditioning system being configured to condition one or more optical elements of the lithographic apparatus, wherein the conditioning system is configured to have a sub-atmospheric pressure at the one or more optical elements. Also provided are a lithographic apparatus comprising such a conditioning system, the use of such a conditioning system, a method of conditioning a system, as well as a lithographic method comprising a sub-atmospheric pressure cooling system

公开(公告)号：US20230176492A1

公开(公告)日：2023-06-08

申请号：US18161140

申请日：2023-01-30

Applicant: Carl Zeiss SMT GmbH ,  ASML NETHERLANDS B.V.

Inventor： Toralf GRUNER ,  Norman BAER ,  Koos VAN BERKEL ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Maike LORENZ ,  Thomas MONZ ,  Eva SCHNEIDER ,  Hans-Michael STIEPAN ,  Bob STREEFKERK ,  André DIRAUF

IPC: G03F7/20 ,  G02B7/18

CPC classification number: G03F7/70891 ,  G02B7/1815 ,  G02B2207/101 ,  G03F7/707

Abstract: Disclosed are an optical system, in particular for microlithography, and a method for operating an optical system. According to one disclosed aspect, the optical system includes at least one mirror (100, 500, 600) having an optical effective surface (101, 501, 601) and a mirror substrate (110, 510, 610), wherein at least one cooling channel (115, 515, 615) in which a cooling fluid is configured to flow is arranged in the mirror substrate, for dissipating heat that is generated in the mirror substrate due to absorption of electromagnetic radiation incident from a light source on the optical effective surface, and a unit (135, 535, 635) to adjust the temperature and/or the flow rate of the cooling fluid either dependent on a measured quantity that characterizes the thermal load in the mirror substrate or dependent on an estimated/expected thermal load in the mirror substrate for a given power of the light source.

公开(公告)号：US20190121248A1

公开(公告)日：2019-04-25

申请号：US16090713

申请日：2017-03-08

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Günes NAKIBOGLU ,  Lowell Lane BAKER ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Hakki Ergün CEKLI ,  Geoffrey Alan SCHULTZ ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Frank Johannes Jacobus VAN BOXTEL ,  Jean-Philippe Xavier VAN DAMME ,  Christopher Charles WARD

IPC: G03F7/20

CPC classification number: G03F7/70875

Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.