公开(公告)号：US20040135985A1

公开(公告)日：2004-07-15

申请号：US10717929

申请日：2003-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC: G03B027/72

CPC classification number: G03F7/70941 ,  G03F7/70916 ,  G03F7/70983

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system to transmit a beam of radiation emitted from a radiation source, and a support structure constructed to hold a patterning structure to be irradiated by the beam. A substrate holder is constructed to hold a substrate, and a projection system is constructed and arranged to project an irradiated portion of the patterning structure onto a target portion of the substrate. A first screen is positioned in a path of the beam between the radiation system and an optical element and a positive voltage is applied to the first screen to repel positively charged particles away from the optical element. A second screen is positioned in the path of the beam on at least one side of the first screen, and a negative voltage is applied to the second screen to repel negative particles away from the first screen.

Abstract translation: 公开了一种光刻投影装置。 该装置包括用于传输从辐射源发射的辐射束的辐射系统，以及构造成保持由光束照射的图案形成结构的支撑结构。 衬底保持器被构造成保持衬底，并且构造和布置投影系统以将图案形成结构的照射部分投影到衬底的目标部分上。 第一屏幕位于辐射系统和光学元件之间的光束的路径中，并且正电压被施加到第一屏幕以将带正电的粒子排斥离开光学元件。 第二屏幕位于第一屏幕的至少一侧上的光束路径中，并且将负电压施加到第二屏幕以排除离开第一屏幕的负面颗粒。