公开(公告)号：US20040160583A1

公开(公告)日：2004-08-19

申请号：US10719065

申请日：2003-11-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Catharinus Hubertus Mulkens ,  Paul Van Der Veen ,  Willem Van Schaik ,  Eric Catey ,  Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Heine Melle Mulder

IPC: G03B027/52

CPC classification number: G03F7/70558 ,  G03F7/70883 ,  G03F7/70933 ,  G03F7/70941

Abstract: In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.

Abstract translation: 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。

公开(公告)号：US20040135985A1

公开(公告)日：2004-07-15

申请号：US10717929

申请日：2003-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC: G03B027/72

CPC classification number: G03F7/70941 ,  G03F7/70916 ,  G03F7/70983

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system to transmit a beam of radiation emitted from a radiation source, and a support structure constructed to hold a patterning structure to be irradiated by the beam. A substrate holder is constructed to hold a substrate, and a projection system is constructed and arranged to project an irradiated portion of the patterning structure onto a target portion of the substrate. A first screen is positioned in a path of the beam between the radiation system and an optical element and a positive voltage is applied to the first screen to repel positively charged particles away from the optical element. A second screen is positioned in the path of the beam on at least one side of the first screen, and a negative voltage is applied to the second screen to repel negative particles away from the first screen.

Abstract translation: 公开了一种光刻投影装置。 该装置包括用于传输从辐射源发射的辐射束的辐射系统，以及构造成保持由光束照射的图案形成结构的支撑结构。 衬底保持器被构造成保持衬底，并且构造和布置投影系统以将图案形成结构的照射部分投影到衬底的目标部分上。 第一屏幕位于辐射系统和光学元件之间的光束的路径中，并且正电压被施加到第一屏幕以将带正电的粒子排斥离开光学元件。 第二屏幕位于第一屏幕的至少一侧上的光束路径中，并且将负电压施加到第二屏幕以排除离开第一屏幕的负面颗粒。

公开(公告)号：US20040179182A1

公开(公告)日：2004-09-16

申请号：US10743270

申请日：2003-12-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Levinus Pieter Bakker

IPC: G03B027/00 ,  G03B027/72

CPC classification number: G03F7/70941 ,  G03F7/70916

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that includes a radiation source and an illumination system that supplies a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, an electrode, and a voltage source that applies an electric field between the radiation source and the electrode to generate a discharge between the radiation source and the electrode.

Abstract translation: 公开了一种光刻投影装置。 该装置包括辐射系统，其包括辐射源和提供辐射束的照明系统，以及支撑图案结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件，将图案化的光束投影到基板的目标部分上的投影系统，电极和在辐射源和电极之间施加电场的电压源，以产生 在辐射源和电极之间放电。

公开(公告)号：US20040218157A1

公开(公告)日：2004-11-04

申请号：US10738976

申请日：2003-12-19

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT AG

Inventor： Levinus Pieter Bakker ,  Ralph Kurt ,  Bastiaan Matthias Mertens ,  Markus Weiss ,  Johann Trenkler ,  Wolfgang Singer

IPC: G03B027/52

CPC classification number: G03F7/70916 ,  B08B6/00 ,  B08B7/0035 ,  G03F7/70925

Abstract: A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.

Abstract translation: 公开了一种用于去除光刻投影装置中的部件表面的至少一部分的污染物的清洁系统。 清洁系统包括产生电场以在组件的表面附近提供清洁颗粒的电场发生器。

公开(公告)号：US20040165160A1

公开(公告)日：2004-08-26

申请号：US10733771

申请日：2003-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Michael Cornelis Van Beek ,  Levinus Pieter Bakker ,  Theodorus Hubertus Josephus Bisschops ,  Jeroen Jonkers ,  Mark Kroon ,  Robertus Adrianus Maria Wolters ,  Adrianus Johannes Henricus Maas

IPC: G03B027/52

CPC classification number: G03F7/70925 ,  B08B7/0057

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.

Abstract translation: 公开了一种光刻投影装置。 该装置包括构造成支撑图形结构的支撑结构。 图形结构适于根据期望的图案对辐射束进行图案化。 该装置还包括被构造成保持基板的基板保持器，被构造和布置成将图案化的光束投影到基板的目标部分上的投影系统，以及连接到气体源的下游自由基源，并且是 被配置为在待清洁的表面上提供自由基束。

公开(公告)号：US20040108465A1

公开(公告)日：2004-06-10

申请号：US10644954

申请日：2003-08-21

Applicant: ASML NETHERLANDS B.V

Inventor： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans ,  Vadim Yevgenyevich Banine

IPC: A61N005/00 ,  G21G005/00

CPC classification number: G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

Abstract: A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the EUV radiation can be transferred on debris present in the EUV beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced.

Abstract translation: 用于EUV光刻的光刻投影装置包括箔陷阱。 在EUV源之后，箔陷阱形成开放结构，以使EUV辐射不受阻碍地通过。 箔捕获器被配置为围绕光轴可旋转。 通过旋转箔阱，可以在EUV波束中存在的碎片上传输横向于EUV辐射传播方向的脉冲。 这个碎片不会通过箔片陷阱。 以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。

公开(公告)号：US20040013226A1

公开(公告)日：2004-01-22

申请号：US10396693

申请日：2003-03-26

Applicant: ASML NETHERLANDS, B.V.

Inventor： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Antonius Johannes Josephus Van Dijsseldonk ,  Marcel Mathijs Theodore Marie Dierichs

IPC: G21K005/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70166 ,  G03F7/7055 ,  G21K1/04 ,  G21K1/043 ,  H05G2/00

Abstract: A controlled aperture provides an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the a second part. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and second parts.

Abstract translation: 受控孔径通过隔离装置的两部分的屏障提供开口，以使辐射脉冲从装置的一部分辐射到第二部分。 受控孔径封闭辐射脉冲之间的开口，以最小化第一和第二部分之间的气体流动。

公开(公告)号：US20040184014A1

公开(公告)日：2004-09-23

申请号：US10743265

申请日：2003-12-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC: G03F007/20 ,  G03B027/52

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

Abstract: A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a radial direction from a main axis, and each of the lamellas is positioned in a respective plane that include the main axis. At least one outer end of each of the lamellas is slidably connected to at least one of the inner and outer ring.

Abstract translation: 公开了一种通过来自辐射源的辐射并捕获来自辐射源的碎片的污染屏障。 污染屏障包括内环，外环和多个薄片。 薄片从主轴沿径向方向延伸，并且每个薄片位于包括主轴线的相应平面中。 每个薄片的至少一个外端可滑动地连接到内圈和外圈中的至少一个。

公开(公告)号：US20040109151A1

公开(公告)日：2004-06-10

申请号：US10639753

申请日：2003-08-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC: G03B027/72

CPC classification number: B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

Abstract: A lithographic projection apparatus includes a radiation system configured to form a projection beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the projection beam provides the projection beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

Abstract translation: 光刻投影设备包括辐射系统，该辐射系统被配置为从由辐射源发射的辐射形成辐射的投射光束，以及被配置为保持图案形成装置的支撑件，当图案形成装置被投影光束照射时，投影光束提供图案 。 衬底台被配置为保持衬底，并且投影系统被配置为将图案形成装置的照射部分成像到衬底的目标部分上。 辐射系统还包括距离光轴一定距离处的孔，当从源观察时，放置在孔后面的反射器和放置在孔后面的低辐射密集区域中的结构。

公开(公告)号：US20040109149A1

公开(公告)日：2004-06-10

申请号：US10716443

申请日：2003-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Van Elp ,  Martinus Hendrikus Antonius Leenders ,  Vadim Yevgenyevich Banine ,  Hugo Matthieu Visser ,  Levinus Pieter Bakker

IPC: G03B027/54 ,  G03B027/72

CPC classification number: G03F7/70575 ,  G03F7/70191 ,  G03F7/702

Abstract: In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.