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1.发明授权公开(公告)号：US10955744B2
公开(公告)日：2021-03-23
申请号：US16100269
申请日：2018-08-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Van Witteveen , Wei-Chun Wang , Paul Jonathan Turner , Elliott Gerard McNamara , Giacomo Miceli
Abstract: A method of determining a parameter of a pattern transfer process and device manufacturing methods are disclosed. In one arrangement, a method includes obtaining a detected representation of radiation redirected by a structure. The structure is a structure formed by applying a pattern processing to a pattern transferred to an earlier formed structure by a pattern transfer process. The pattern processing is such as to remove one or more selected regions in a horizontal plane of the earlier formed structure to form a pattern in the horizontal plane. The pattern is defined by a unit cell that is mirror symmetric with respect to an axis of mirror symmetry. An asymmetry in the detected representation is determined. The determined asymmetry in the detected representation is used to determine a parameter of the pattern transfer process.
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2.发明申请公开(公告)号：US20190064653A1
公开(公告)日：2019-02-28
申请号：US16100269
申请日：2018-08-10
Applicant: ASML Netherlands B.V.
Inventor： Koen Van Witteveen , Wei-Chun Wang , Paul Jonathan Turner , Elliott Gerard Mc Namara , Giacomo Miceli
Abstract: A method of determining a parameter of a pattern transfer process and device manufacturing methods are disclosed. In one arrangement, a method includes obtaining a detected representation of radiation redirected by a structure. The structure is a structure formed by applying a pattern processing to a pattern transferred to an earlier formed structure by a pattern transfer process. The pattern processing is such as to remove one or more selected regions in a horizontal plane of the earlier formed structure to form a pattern in the horizontal plane. The pattern is defined by a unit cell that is mirror symmetric with respect to an axis of mirror symmetry. An asymmetry in the detected representation is determined. The determined asymmetry in the detected representation is used to determine a parameter of the pattern transfer process.
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