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    LITHOGRAPHIC APPARATUS AND METHOD
    1.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号：US20160116848A1

    公开(公告)日：2016-04-28

    申请号：US14988944

    申请日：2016-01-06

    申请人： ASML NETHERLANDS B.V.

    发明人： Heine Melle MULDER ,  Johannes Jacobus Matheus BASELMANS ,  Adrianus Franciscus Petrus ENGELEN ,  Markus Franciscus Antonius EURLINGS ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Paul VAN DER VEEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Wilfred Edward ENDENDIJK

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

    摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

    摘要翻译： 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。

    Lithographic Apparatus and a Method for Determining a Polarization Property
    2.
    发明申请
    Lithographic Apparatus and a Method for Determining a Polarization Property 有权
    平版印刷设备和确定极化性能的方法

    公开(公告)号：US20130176547A1

    公开(公告)日：2013-07-11

    申请号：US13786400

    申请日：2013-03-05

    申请人： ASML Netherlands B.V.

    发明人： Marcus Adrianus VAN DE KERKHOF ,  Wilhelmus Petrus DE BOEIJ ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Michel Fransois Hubert KLAASSEN ,  Martijn Gerard Dominique WEHRENS ,  Haico Victor KOK ,  Wilhelmus Jacobus Maria Rooijakkers ,  Tammo UITTERDIJK

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70133 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

    摘要： A lithographic apparatus includes an illumination system, a support, a patterning device, a substrate table, a projection system, and a detector. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable and a polarization analyzer, such as a linear polarizer. The polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.

    摘要翻译： 光刻设备包括照明系统，支撑件，图案形成装置，衬底台，投影系统和检测器。 该装置还包括可调节的诸如四分之一波片的偏振改变元件和诸如线性偏振器的偏振分析器。 偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。 通过对偏振变化元件的不同旋转取向进行强度测量，可以获得关于图案形成装置的电平处的辐射的偏振状态的信息。 由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。

    Laser Beam Monitoring System
    3.
    发明申请
    Laser Beam Monitoring System 审中-公开

    公开(公告)号：US20200341386A1

    公开(公告)日：2020-10-29

    申请号：US16765364

    申请日：2018-10-26

    申请人： ASML Netherlands B.V.

    发明人： Hendrikus Robertus Marie VAN GREEVENBROEK

    IPC分类号： G03F7/20 ,  G01J1/04 ,  G02B27/10

    摘要： A laser beam monitoring system configured to monitor an attribute of an incident laser beam (24), the laser beam monitoring system comprising a beam separating element (30) and a plurality of sensors (34a-34d), wherein the beam separating element is configured to form a plurality of sub-beams (24a-24d) from the incident laser beam (24), a first sub-beam being directed towards a first sensor of the plurality of sensors and a second sub-beam being directed towards a second sensor of the plurality of sensors, wherein relative intensities of the first and second sub-beams are determined by a spatial position at which the incident laser beam is incident upon the beam separating element.