公开(公告)号：US20240337956A1

公开(公告)日：2024-10-10

申请号：US18578780

申请日：2022-07-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Lucas Christiaan Johan HEIJMANS ,  Imre Rudolf Richard DEHNER ,  Raymond Wilhelmus Louis LAFARRE ,  Cornelis Christiaan OTTENS ,  Marcus Adrianus VAN DE KERKHOF ,  Andrey NIKIPELOV ,  Dennis VANOTTERDIJK ,  Edwin Johannes Theodorus SMULDERS ,  Andrei Mikhailovich YAKUNIN ,  Guido SALMASO ,  Luc VOORDECKERS ,  Chaitanya Krishna ANDE ,  Martinus Jacobus Johannes COENEN

IPC: G03F7/00 ,  G03F1/62

CPC classification number: G03F7/70925 ,  G03F7/70708 ,  G03F7/7085 ,  G03F7/70875 ,  G03F1/62

Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms include: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.