公开(公告)号：US20170292566A1

公开(公告)日：2017-10-12

申请号：US15513086

申请日：2015-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Siegfried Alexander TROMP ,  Antonie Hendrik VERWEIJ ,  Abraham Alexander SOETHOUDT ,  Jan Pieter VAN DE POEL ,  Mark Constant Johannes BAGGEN

IPC: F16C32/06 ,  F16C29/02 ,  G03F7/20

CPC classification number: F16C32/0611 ,  F16C29/025 ,  F16C32/0607 ,  G03F7/20 ,  G03F7/707 ,  G03F7/708 ,  H01L21/6831 ,  H01L21/6833

Abstract: A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate,

公开(公告)号：US20210381548A1

公开(公告)日：2021-12-09

申请号：US17407778

申请日：2021-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Siegfried Alexander TROMP ,  Antonie Hendrik VERWEIJ ,  Abraham Alexander SOETHOUDT ,  Jan Pieter VAN DE POEL

IPC: F16C32/06 ,  H01L21/683 ,  F16C29/02 ,  G03F7/20

Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.