公开(公告)号：US09699876B2

公开(公告)日：2017-07-04

申请号：US14151600

申请日：2014-01-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Georgiy Vaschenko ,  Peter Baumgart ,  Jeffrey Gacutan ,  Martin Algots ,  Theodosios Syrpis ,  Chirag Rajyaguru ,  Sanjeev Seshagiri

IPC: G03B27/42 ,  G01K5/00 ,  H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/6416

Abstract: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir in which the target material may be replenished while a nozzle portion of the droplet generator is maintained at temperature. Also disclosed is a system for selectively draining spent target material.