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1.发明申请公开(公告)号：US20160274466A1
公开(公告)日：2016-09-22
申请号：US15168431
申请日：2016-05-31
Applicant: ASML Netherlands B.V.
Inventor： Silvia De Dea , Georgiy O. Vaschenko , Peter Baumgart , Norbert Bowering
CPC classification number: G03F7/70033 , C23C14/185 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.
Abstract translation: 用于极紫外（EUV）光源的目标材料供应装置包括管，其包括限定在第一和第二端之间的第一端，第二端和侧壁。 管的外表面的至少一部分包括电绝缘材料，第一端容纳加压目标材料，第二端限定出加压目标材料通过的孔，以产生目标材料液滴流。 目标材料供应装置还包括在管的外表面上的导电涂层。 涂层被配置为将管的外表面电连接到地，从而减少外表面上的表面电荷。
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公开(公告)号：US11317501B2
公开(公告)日：2022-04-26
申请号：US16572131
申请日：2019-09-16
Applicant: ASML Netherlands B.V.
Inventor： Georgiy Vaschenko , Peter Baumgart , Chirag Rajyaguru , Benjamin Sams , Armin Ridinger , Janine Kardokus
Abstract: A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.
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公开(公告)号：US10455680B2
公开(公告)日：2019-10-22
申请号：US15057086
申请日：2016-02-29
Applicant: ASML Netherlands B.V.
Inventor： Georgiy Vaschenko , Peter Baumgart , Chirag Rajyaguru , Benjamin Sams , Armin Ridinger , Janine Kardokus
Abstract: A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.
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Patent Agency Ranking
公开(公告)号：US09699876B2
公开(公告)日：2017-07-04
申请号：US14151600
申请日：2014-01-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Georgiy Vaschenko , Peter Baumgart , Jeffrey Gacutan , Martin Algots , Theodosios Syrpis , Chirag Rajyaguru , Sanjeev Seshagiri
CPC classification number: H05G2/006 , H05G2/005 , H05G2/008 , Y10T137/6416
Abstract: An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir in which the target material may be replenished while a nozzle portion of the droplet generator is maintained at temperature. Also disclosed is a system for selectively draining spent target material.
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公开(公告)号：US20170247778A1
公开(公告)日：2017-08-31
申请号：US15057086
申请日：2016-02-29
Applicant: ASML Netherlands B.V.
Inventor： Georgiy Vaschenko , Peter Baumgart , Chirag Rajyaguru , Benjamin Sams , Armin Ridinger , Janine Kardokus
Abstract: A deoxidation system for purifying target material for an EUV light source includes a furnace having a central region and a heater for heating the central region in a uniform manner. A vessel is inserted in the central region of the furnace, and a crucible is disposed within the vessel. A closure device covers an open end of the vessel to form a seal having vacuum and pressure capability. The system also includes a gas input tube, a gas exhaust tube, and a vacuum port. A gas supply network is coupled in flow communication with an end of the gas input tube and a gas supply network is coupled in flow communication with an end of the gas exhaust tube. A vacuum network is coupled in flow communication with one end of the vacuum port. A method and apparatus for purifying target material also are described.
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公开(公告)号：US09632418B2
公开(公告)日：2017-04-25
申请号：US15168431
申请日：2016-05-31
Applicant: ASML Netherlands B.V.
Inventor： Silvia De Dea , Georgiy O. Vaschenko , Peter Baumgart , Norbert Bowering
CPC classification number: G03F7/70033 , C23C14/185 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.
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公开(公告)号：US09544983B2
公开(公告)日：2017-01-10
申请号：US14533813
申请日：2014-11-05
Applicant: ASML Netherlands B.V.
Inventor： Chirag Rajyaguru , John M. Algots , Tetsuya Ishikawa , Peter Baumgart
IPC: H05G2/00
Abstract: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.
Abstract translation: 公开了一种EUV光源目标材料处理系统，其包括目标材料分配器和目标材料储存库，其中通过使用感应加热将目标材料储存库中的固体目标材料转化为液体形式的目标材料。
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8.发明授权公开(公告)号：US09392678B2
公开(公告)日：2016-07-12
申请号：US13652755
申请日：2012-10-16
Applicant: ASML Netherlands B.V.
Inventor： Silvia De Dea , Georgiy O. Vaschenko , Peter Baumgart , Norbert Bowering
CPC classification number: G03F7/70033 , C23C14/185 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.
Abstract translation: 用于极紫外（EUV）光源的目标材料供应装置包括管，其包括限定在第一和第二端之间的第一端，第二端和侧壁。 管的外表面的至少一部分包括电绝缘材料，第一端容纳加压目标材料，第二端限定出加压目标材料通过的孔，以产生目标材料液滴流。 目标材料供应装置还包括在管的外表面上的导电涂层。 涂层被配置为将管的外表面电连接到地，从而减少外表面上的表面电荷。
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