公开(公告)号：US11435673B2

公开(公告)日：2022-09-06

申请号：US17440251

申请日：2020-03-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Kevin Van De Ruit ,  Roy Werkman ,  Jochem Sebastiaan Wildenberg

IPC: G03F9/00 ,  G03F7/20

Abstract: A method of determining a set of metrology point locations, the set including a subset of potential metrology point locations on a substrate, the method including: determining a relation between noise distributions associated with a plurality of the potential metrology point locations using existing knowledge; and using the determined relation and a model associated with the substrate to determine the set.

公开(公告)号：US10459354B2

公开(公告)日：2019-10-29

申请号：US15565082

申请日：2016-03-24

Applicant: ASML Netherlands B.V.

Inventor： Kevin Van De Ruit ,  Bart Dinand Paarhuis ,  Jean-Philippe Xavier Van Damme ,  Johannes Onvlee ,  Cornelis Melchior Brouwer

IPC: G01B11/24 ,  G03F7/20 ,  G03F1/62

Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.