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公开(公告)号:US11347152B2
公开(公告)日:2022-05-31
申请号:US16961081
申请日:2018-12-19
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor: Cornelis Melchior Brouwer , Krishanu Shome
Abstract: A system for and method of processing a wafer in which a scan signal is analyzed locally to extract information about alignment, overlay, mark quality, wafer quality, and the like.
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公开(公告)号:US10459354B2
公开(公告)日:2019-10-29
申请号:US15565082
申请日:2016-03-24
Applicant: ASML Netherlands B.V.
Inventor: Kevin Van De Ruit , Bart Dinand Paarhuis , Jean-Philippe Xavier Van Damme , Johannes Onvlee , Cornelis Melchior Brouwer
Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.
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公开(公告)号:US11774861B2
公开(公告)日:2023-10-03
申请号:US17775802
申请日:2020-10-12
Applicant: ASML Netherlands B.V.
Inventor: Cornelis Melchior Brouwer , Chung-Hsun Li
CPC classification number: G03F7/70516 , G03F7/70491
Abstract: Disclosed is a method of determining calibrated reference exposure and measure grids for referencing position of a substrate stage in a lithographic system. The method comprises obtaining calibration data relating to one or more calibration substrates; and determining an exposure grid for an exposure side of the lithographic system from said calibration data and a measure grid for a measure side of the lithographic system from said calibration data. The exposure grid and said measure grid are decomposed so as to remove a calibration substrate dependent component from said exposure grid and from said measure grid to obtain a substrate independent exposure grid and substrate independent measure grid.
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