公开(公告)号：US11347152B2

公开(公告)日：2022-05-31

申请号：US16961081

申请日：2018-12-19

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Cornelis Melchior Brouwer ,  Krishanu Shome

IPC: G03F7/20 ,  G03F9/00

Abstract: A system for and method of processing a wafer in which a scan signal is analyzed locally to extract information about alignment, overlay, mark quality, wafer quality, and the like.

公开(公告)号：US10459354B2

公开(公告)日：2019-10-29

申请号：US15565082

申请日：2016-03-24

Applicant: ASML Netherlands B.V.

Inventor： Kevin Van De Ruit ,  Bart Dinand Paarhuis ,  Jean-Philippe Xavier Van Damme ,  Johannes Onvlee ,  Cornelis Melchior Brouwer

IPC: G01B11/24 ,  G03F7/20 ,  G03F1/62

Abstract: A lithographic apparatus including a support to support a patterning device, a substrate table to hold a substrate, and a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. A transparent layer is provided to protect the pattering device. The apparatus further includes a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, and a compensator device which is configured to control the projection system, the substrate table and/or the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.

公开(公告)号：US11774861B2

公开(公告)日：2023-10-03

申请号：US17775802

申请日：2020-10-12

Applicant: ASML Netherlands B.V.

Inventor： Cornelis Melchior Brouwer ,  Chung-Hsun Li

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70516 ,  G03F7/70491

Abstract: Disclosed is a method of determining calibrated reference exposure and measure grids for referencing position of a substrate stage in a lithographic system. The method comprises obtaining calibration data relating to one or more calibration substrates; and determining an exposure grid for an exposure side of the lithographic system from said calibration data and a measure grid for a measure side of the lithographic system from said calibration data. The exposure grid and said measure grid are decomposed so as to remove a calibration substrate dependent component from said exposure grid and from said measure grid to obtain a substrate independent exposure grid and substrate independent measure grid.