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公开(公告)号：US11994845B2
公开(公告)日：2024-05-28
申请号：US17367901
申请日：2021-07-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Sarathi Roy , Edo Maria Hulsebos , Roy Werkman , Junru Ruan
IPC: G05B19/418 , G03F7/00 , G05B13/02 , G06N3/044
CPC classification number: G05B19/41875 , G03F7/70508 , G03F7/70525 , G05B13/027 , G05B19/41885 , G06N3/044 , G05B2219/33025 , G05B2219/45028 , G05B2219/45031
Abstract: A method for configuring a semiconductor manufacturing process, the method including: obtaining a first value of a first parameter based on measurements associated with a first operation of a process step in the semiconductor manufacturing process and a first sampling scheme; using a recurrent neural network to determine a predicted value of the first parameter based on the first value; and using the predicted value of the first parameter in configuring a subsequent operation of the process step in the semiconductor manufacturing process.
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公开(公告)号：US11435673B2
公开(公告)日：2022-09-06
申请号：US17440251
申请日：2020-03-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Kevin Van De Ruit , Roy Werkman , Jochem Sebastiaan Wildenberg
Abstract: A method of determining a set of metrology point locations, the set including a subset of potential metrology point locations on a substrate, the method including: determining a relation between noise distributions associated with a plurality of the potential metrology point locations using existing knowledge; and using the determined relation and a model associated with the substrate to determine the set.
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公开(公告)号：US11086305B2
公开(公告)日：2021-08-10
申请号：US17174159
申请日：2021-02-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Sarathi Roy , Edo Maria Hulsebos , Roy Werkman , Junru Ruan
IPC: G05B19/418 , G05B13/02 , G03F7/20 , G06N3/04
Abstract: A method for configuring a semiconductor manufacturing process, the method including: obtaining a first value of a first parameter based on measurements associated with a first operation of a process step in the semiconductor manufacturing process and a first sampling scheme; using a recurrent neural network to determine a predicted value of the first parameter based on the first value; and using the predicted value of the first parameter in configuring a subsequent operation of the process step in the semiconductor manufacturing process.
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公开(公告)号：US10928737B2
公开(公告)日：2021-02-23
申请号：US16079404
申请日：2017-02-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Everhardus Cornelis Mos , Jochem Sebastiaan Wildenberg , Roy Werkman , Erik Johannes Maria Wallerbos
IPC: G03F7/20
Abstract: A method of characterizing distortions in a lithographic process, and associated apparatuses. The method includes obtaining measurement data corresponding to a plurality of measurement locations on a substrate, the measurement data comprising measurements performed on a plurality of substrates, and comprising one or more measurements performed on one or more of the substrates for each of the measurement locations. For each of the measurement locations, a first quality value representing a quality metric and a noise value representing a noise metric is determined from the measurements performed at that measurement location. A plurality of distortion parameters is determined, each distortion parameter configured to characterize a systematic distortion in the quality metric and a statistical significance of the distortion parameters from the first quality value and from the noise value is determined. Systematic distortion is parameterized from the distortion parameters determined to be statistically significant.
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公开(公告)号：US20210003927A1
公开(公告)日：2021-01-07
申请号：US17023474
申请日：2020-09-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Davit Harutyunyan , Fei Jia , Frank Staals , Fuming Wang , Hugo Thomas Looijestijn , Cornelis Johannes Rijnierse , Maxim Pisarenco , Roy Werkman , Thomas Theeuwes , Tom Van Hemert , Vahid Bastani , Jochem Sebastiaan Wildenberg , Everhardus Cornelis Mos , Erik Johannes Maria Wallerbos
Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
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Patent Agency Ranking
公开(公告)号：US11327406B2
公开(公告)日：2022-05-10
申请号：US17055215
申请日：2019-04-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Svetla Petrova Matova , Jochem Sebastiaan Wildenberg , Roy Werkman , Luc Roumen
IPC: G03F7/20
Abstract: A method for estimating a parameter across a region on a substrate, the region being divided into a plurality of sub-regions, the method including: obtaining values of the parameter for at least two sub-regions out of the plurality of sub-regions; and estimating the parameter for a position on the region by evaluation of a function having said values of the parameter as input values, wherein the function: a) has piecewise defined base functions, wherein a single base function is defined across a sub-region; and b) is continuous between one or more adjacent sub-regions of the at least two sub-regions within the region.
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公开(公告)号：US11378891B2
公开(公告)日：2022-07-05
申请号：US17023474
申请日：2020-09-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Davit Harutyunyan , Fei Jia , Frank Staals , Fuming Wang , Hugo Thomas Looijestijn , Cornelis Johannes Rijnierse , Maxim Pisarenco , Roy Werkman , Thomas Theeuwes , Tom Van Hemert , Vahid Bastani , Jochem Sebastiaan Wildenberg , Everhardus Cornelis Mos , Erik Johannes Maria Wallerbos
Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.
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公开(公告)号：US11372338B2
公开(公告)日：2022-06-28
申请号：US16979056
申请日：2019-02-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivo Matteo Leonardus Weijden , Jeroen Van Dongen , Cornelis Johannes Henricus Lambregts , Theo Wilhelmus Maria Thijssen , Ruud Rudolphus Johannes Catharinus De Wit , Hans Marinus Struijs , Erik Mathijs Maria Crombag , Roy Werkman , Maria Helena Schut , Erwin Riemens , Menno Meeldijk
Abstract: A method for determining a preferred control strategy relating to control of a manufacturing process for manufacturing an integrated circuit. The method includes: obtaining process data associated with a design of said integrated circuit; and obtaining a plurality of candidate control strategies configured to control the manufacturing process based on the process data, each candidate control strategy including an associated cost metric based on an associated requirement to implement the candidate control strategy. A quality metric related to an expected performance of the manufacturing process is determined for each candidate control strategies, and a preferred control strategy is selected based on the determined quality metrics and associated cost metrics for each candidate control strategy.
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公开(公告)号：US10884345B2
公开(公告)日：2021-01-05
申请号：US16822870
申请日：2020-03-18
Applicant: ASML Netherlands B.V.
Inventor： Emil Peter Schmitt-Weaver , Jens Stäcker , Koenraad Remi André Maria Schreel , Roy Werkman
Abstract: A first substrate 2002 has a calibration pattern applied to a first plurality of fields 2004 by a lithographic apparatus. Further substrates 2006, 2010 have calibration patterns applied to further pluralities of fields 2008, 2012. The different pluralities of fields have different sizes and/or shapes and/or positions. Calibration measurements are performed on the patterned substrates 2002, 2006, 2010 and used to obtain corrections for use in controlling the apparatus when applying product patterns to subsequent substrates. Measurement data representing the performance of the apparatus on fields of two or more different dimensions (fields 2004, 2008, 2012 in this example) is gathered together in a database 2013 and used to synthesize the information needed to calibrate the apparatus for a new size. Calibration data is also obtained for different scan and step directions.
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公开(公告)号：US10725372B2
公开(公告)日：2020-07-28
申请号：US15546583
申请日：2016-01-20
Applicant: ASML Netherlands B.V.
Inventor： Wim Tjibbo Tel , Marinus Jochemsen , Frank Staals , Christopher Prentice , Laurent Michel Marcel Depre , Johannes Marcus Maria Beltman , Roy Werkman , Jochem Sebastiaan Wildenberg , Everhardus Cornelis Mos
IPC: G06F17/50 , G03F1/70 , G03F1/36 , G03F1/22 , G06T7/00 , G06F30/398 , G06F119/18 , G06F30/20 , G06F30/367
Abstract: A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.
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