公开(公告)号：US20250004385A1

公开(公告)日：2025-01-02

申请号：US18684048

申请日：2022-09-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Marc Johannes NOOT ,  Simon Gijsbert Josephus MATHIJSSEN ,  Scott Anderson MIDDLEBROOKS ,  Kaustuve BHATTACHARYYA

IPC: G03F7/00 ,  H01L21/66

Abstract: A method to determine a metrology contribution from statistically independent sources, the method including providing a plurality of contributions from statistically independent sources obtained at a plurality of measurement settings, and determining a metrology contribution from the contributions wherein the metrology contribution is the contribution having least dependence as a function of the measurement settings.

公开(公告)号：US20220075276A1

公开(公告)日：2022-03-10

申请号：US17419648

申请日：2019-12-24

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus MATHIJSSEN ,  Marc Johannes NOOT ,  Kaustuve BHATTACHARYYA ,  Arie Jeffrey DEN BOEF ,  Grzegorz GRZELA ,  Timothy Dugan DAVIS ,  Olger Victor ZWIER ,  Ralph Timtheus HUIJGEN ,  Peter David ENGBLOM ,  Jan-Willem GEMMINK

IPC: G03F7/20 ,  G06T7/00 ,  G01N21/47

Abstract: A method provides the steps of receiving an image from a metrology tool, determining individual units of said image and discriminating the units which provide accurate metrology values. The images are obtained by measuring the metrology target at multiple wavelengths. The discrimination between the units, when these units are pixels in said image, is based on calculating a degree of similarity between said units.

公开(公告)号：US20190033727A1

公开(公告)日：2019-01-31

申请号：US16026507

申请日：2018-07-03

Applicant: ASML Netherlands B.V.

Inventor： Marc Johannes NOOT ,  Simon Gijsbert Josephus MATHIJSSEN ,  Kaustuve BHATTACHARYYA ,  Jinmoo BYUN ,  Hyun-Su KIM ,  Won-Jae JANG ,  Timothy Dugan DAVIS

IPC: G03F7/20

Abstract: Disclosed are a method, computer program and a metrology apparatus for measuring a process effect parameter relating to a manufacturing process for manufacturing integrated circuits on a substrate. The method comprises determining for a structure, a first quality metric value for a quality metric from a plurality of measurement values each relating to a different measurement condition while cancelling or mitigating for the effect of the process effect parameter on the plurality of measurement values and a second quality metric value for the quality metric from at least one measurement value relating to at least one measurement condition without cancelling or mitigating for the effect of the process effect parameter on the at least one measurement value. The process effect parameter value for the process effect parameter can then be calculated from the first quality metric value and the second quality metric value, for example by calculating their difference.