公开(公告)号：US20190354021A1

公开(公告)日：2019-11-21

申请号：US16483660

申请日：2018-01-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Michael Johannes VERVOORDELDONK ,  Maurice Willem Jozef Etiënne WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus is described, the apparatus comprising: a projection system configured to project a patterned beam of radiation onto a substrate; the projection system comprising a plurality of optical elements; a sensor frame; a first position measurement system configured to measure a position of the plurality of optical elements relative to the sensor frame; wherein the sensor frame comprises: N sub-frames, N being an integer >1, a coupling system coupling the N sub-frames and a second position measurement system configured to determine a relative position of the N sub-frames.

公开(公告)号：US20190033733A1

公开(公告)日：2019-01-31

申请号：US16072218

申请日：2017-02-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Michael Johannes VERVOORDELDONK ,  Joeri LOF

IPC: G03F7/20 ,  B65G47/24

CPC classification number: G03F9/7011 ,  B65G47/24 ,  B65G2203/042 ,  G03F7/70258 ,  G03F7/70733 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70875

Abstract: A substrate handling system for handling a substrate, the substrate handling system including a holder for holding the substrate, a rotation device for rotating the holder around an axis perpendicular to a plane, and a mover for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus including the substrate handling system. The substrate handling system may include a coupling device arranged to couple the holder to the mover or the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the mover or rotation device in a second situation.