公开(公告)号：US12044981B2

公开(公告)日：2024-07-23

申请号：US17381817

申请日：2021-07-21

申请人： ASML NETHERLANDS B.V.

发明人： Marc Hauptmann ,  Everhardus Cornelis Mos ,  Weitian Kou ,  Alexander Ypma ,  Michiel Kupers ,  Hyunwoo Yu ,  Min-Sub Han

IPC分类号： G03F7/00 ,  G03F9/00

CPC分类号： G03F7/70633 ,  G03F7/70525 ,  G03F7/7085 ,  G03F9/7003

摘要： A lithographic process is performed on a set of semiconductor substrates consisting of a plurality of substrates. As part of the process, the set of substrates is partitioned into a number of subsets. The partitioning may be based on a set of characteristics associated with a first layer on the substrates. A fingerprint of a performance parameter is then determined for at least one substrate of the set of substrates. Under some circumstances, the fingerprint is determined for one substrate of each subset of substrates. The fingerprint is associated with at least the first layer. A correction for the performance parameter associated with an application of a subsequent layer is then derived, the derivation being based on the determined fingerprint and the partitioning of the set of substrates.

公开(公告)号：US20210349402A1

公开(公告)日：2021-11-11

申请号：US17381817

申请日：2021-07-21

申请人： ASML NETHERLANDS B.V.

发明人： Marc HAUPTMANN ,  Everhardus Cornelis Mos ,  Weitian Kou ,  Alexander Ypma ,  Michiel Kupers ,  Hyunwoo Yu ,  Min-Sub Han

IPC分类号： G03F7/20 ,  G03F9/00

摘要： A lithographic process is performed on a set of semiconductor substrates consisting of a plurality of substrates. As part of the process, the set of substrates is partitioned into a number of subsets. The partitioning may be based on a set of characteristics associated with a first layer on the substrates. A fingerprint of a performance parameter is then determined for at least one substrate of the set of substrates. Under some circumstances, the fingerprint is determined for one substrate of each subset of substrates. The fingerprint is associated with at least the first layer. A correction for the performance parameter associated with an application of a subsequent layer is then derived, the derivation being based on the determined fingerprint and the partitioning of the set of substrates.

公开(公告)号：US11099487B2

公开(公告)日：2021-08-24

申请号：US16495416

申请日：2018-03-28

申请人： ASML NETHERLANDS B.V.

发明人： Marc Hauptmann ,  Everhardus Cornelis Mos ,  Weitian Kou ,  Alexander Ypma ,  Michiel Kupers ,  Hyunwoo Yu ,  Min-Sub Han

IPC分类号： G03F7/20 ,  G03F9/00

摘要： A lithographic process is performed on a set of semiconductor substrates consisting of a plurality of substrates. As part of the process, the set of substrates is partitioned into a number of subsets. The partitioning may be based on a set of characteristics associated with a first layer on the substrates. A fingerprint of a performance parameter is then determined for at least one substrate of the set of substrates. Under some circumstances, the fingerprint is determined for one substrate of each subset of substrates. The fingerprint is associated with at least the first layer. A correction for the performance parameter associated with an application of a subsequent layer is then derived, the derivation being based on the determined fingerprint and the partitioning of the set of substrates.