公开(公告)号：US20230251583A1

公开(公告)日：2023-08-10

申请号：US18015155

申请日：2021-05-31

Applicant: ASML Netherlands B.V.

Inventor： Oleg Viacheslavovich VOZNYI ,  Bearrach MOEST

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/7085 ,  G03F7/70716 ,  G03F7/70558

Abstract: The present invention relates to a stage system (130), which comprises a pre-exposure element (134), and to a method employing the pre-exposure element for conditioning an optical system (100). The pre-exposure element comprises a radiation receiving area at a surface of the stage system, wherein the radiation receiving area comprises at least one pre-exposure plate configured to receive radiation. The stage system comprises further a controller (140), wherein the controller is capable to control an optical parameter of the pre-exposure element, herewith controlling a portion of received radiation reflected by the pre-exposure element.

公开(公告)号：US20220214626A1

公开(公告)日：2022-07-07

申请号：US17606785

申请日：2020-03-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Mark Johannes Hermanus FRENCKEN ,  Theodorus Marcus NAGTEGAAL ,  Oleg Viacheslavovich VOZNYI

IPC: G03F7/20

Abstract: The invention provides an object positioner comprising:—an object support having an object support surface which is configured to engage at least a part of an object, said object support surface having a support surface temperature,—a thermal device, which thermal device is configured to provide at least a part of the object with a first object temperature, which first object temperature differs from the support surface temperature by a first predetermined temperature difference.

公开(公告)号：US20250028258A1

公开(公告)日：2025-01-23

申请号：US18684391

申请日：2022-07-25

Applicant: ASML Netherlands B.V.

Inventor： Oleg Viacheslavovich VOZNYI ,  Haico Victor KOK

IPC: G03F9/00 ,  G03F7/00

Abstract: A system includes a radiation source, an optical system, an optical element, a detection system, and a processor. The radiation source is configured to generate a radiation beam. The optical system is configured to direct the radiation beam toward a target structure and to receive the scattered radiation. The target structure is configured to produce scattered radiation comprising one or more scattered beams. The optical element is configured to control a position of the one or more scattered beams. The detection system is configured to receive a portion of the position-controlled scattered radiation and to generate a detection signal. The processor is configured to determine a property of the target structure based on at least the detection signal.