公开(公告)号：US20170097579A1

公开(公告)日：2017-04-06

申请号：US15289118

申请日：2016-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Yuri Johannes Gabriel VAN DE VIJVER ,  Johannes Hubertus Josephina MOORS ,  Wendelin Johanna Maria VERSTEEG ,  Peter Gerardus JONKERS

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70841 ,  G03F7/70866 ,  G03F7/70883 ,  G03F7/70916

Abstract: A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber.