公开(公告)号：US20170097579A1

公开(公告)日：2017-04-06

申请号：US15289118

申请日：2016-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Yuri Johannes Gabriel VAN DE VIJVER ,  Johannes Hubertus Josephina MOORS ,  Wendelin Johanna Maria VERSTEEG ,  Peter Gerardus JONKERS

IPC: G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70841 ,  G03F7/70866 ,  G03F7/70883 ,  G03F7/70916

Abstract: A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber.

公开(公告)号：US20210053177A1

公开(公告)日：2021-02-25

申请号：US16963576

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bert Dirk SCHOLTEN ,  Satish ACHANTA ,  Aydar AKCHURIN ,  Pavlo ANTONOV ,  Coen Hubertus Matheus BALTIS ,  Jeroen BOUWKNEGT ,  Ann-Sophie m. FARLE ,  Christopher John MASON ,  Ralph Nicholas PALERMO ,  Thomas POIESZ ,  Yuri Johannes Gabriel VAN DE VIJVER ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC: B24B27/033 ,  B24B1/04 ,  B24B7/07 ,  B24B7/22 ,  G03F7/20 ,  H01L21/304

Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.