公开(公告)号：US10426020B2

公开(公告)日：2019-09-24

申请号：US15013930

申请日：2016-02-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Peter M. Baumgart ,  John Martin Algots ,  Abhiram Govindaraju ,  Chirag Rajyaguru

IPC: H05G2/00 ,  F16C11/12 ,  G21K5/00 ,  G21K5/08

Abstract: Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.

公开(公告)号：US08969840B2

公开(公告)日：2015-03-03

申请号：US14452418

申请日：2014-08-05

Applicant: ASML Netherlands B.V.

Inventor： Chirag Rajyaguru ,  Peter M. Baumgart ,  Georgiy O. Vaschenko

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.

Abstract translation: 用于产生EUV辐射的系统（及其方法），其包括产生针对照射区域和液滴源的激光束的布置。 液滴源包括离开孔的流体和具有产生流体扰动的电致动元件的子系统。 电致动元件由第一波形驱动以产生用于照射的液滴以产生EUV辐射，由第一波形产生的具有不同初始速度的液滴导致至少一些相邻的液滴在液滴行进到照射区域时聚结， 以及与第一波形不同的第二波形，以从孔口移除污染物。

公开(公告)号：US20140346373A1

公开(公告)日：2014-11-27

申请号：US14452418

申请日：2014-08-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Chirag Rajyaguru ,  Peter M. Baumgart ,  Georgiy O. Vaschenko

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.

Abstract translation: 用于产生EUV辐射的系统（及其方法），其包括产生针对照射区域和液滴源的激光束的布置。 液滴源包括离开孔的流体和具有产生流体扰动的电致动元件的子系统。 电致动元件由第一波形驱动以产生用于照射的液滴以产生EUV辐射，由第一波形产生的具有不同初始速度的液滴导致至少一些相邻的液滴在液滴行进到照射区域时聚结， 以及与第一波形不同的第二波形，以从孔口移除污染物。