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公开(公告)号：US20180364580A1
公开(公告)日：2018-12-20
申请号：US16061847
申请日：2016-12-15
Applicant: ASML Netherlands B.V.
Inventor： Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Koen Gerhardus Winkels , Theodorus Wilhelmus Driessen , Georgiy O. Vaschenko , Peter Michael Baumgart , Wilhelmus Henricus Theodorus Maria Aangenent , Jan Okke Nieuwenkamp , Wim Ronald Kampinga , Jari Ruotsalainen
CPC classification number: G03F7/70033 , H05G2/006 , H05G2/008
Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.
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公开(公告)号：US10481498B2
公开(公告)日：2019-11-19
申请号：US16061847
申请日：2016-12-15
Applicant: ASML Netherlands B.V.
Inventor： Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Koen Gerhardus Winkels , Theodorus Wilhelmus Driessen , Georgiy O. Vaschenko , Peter Michael Baumgart , Wilhelmus Henricus Theodorus Maria Aangenent , Jan Okke Nieuwenkamp , Wim Ronald Kampinga , Jari Ruotsalainen
Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.
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公开(公告)号：US09632418B2
公开(公告)日：2017-04-25
申请号：US15168431
申请日：2016-05-31
Applicant: ASML Netherlands B.V.
Inventor： Silvia De Dea , Georgiy O. Vaschenko , Peter Baumgart , Norbert Bowering
CPC classification number: G03F7/70033 , C23C14/185 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.
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4.发明授权公开(公告)号：US09392678B2
公开(公告)日：2016-07-12
申请号：US13652755
申请日：2012-10-16
Applicant: ASML Netherlands B.V.
Inventor： Silvia De Dea , Georgiy O. Vaschenko , Peter Baumgart , Norbert Bowering
CPC classification number: G03F7/70033 , C23C14/185 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.
Abstract translation: 用于极紫外（EUV）光源的目标材料供应装置包括管，其包括限定在第一和第二端之间的第一端，第二端和侧壁。 管的外表面的至少一部分包括电绝缘材料，第一端容纳加压目标材料，第二端限定出加压目标材料通过的孔，以产生目标材料液滴流。 目标材料供应装置还包括在管的外表面上的导电涂层。 涂层被配置为将管的外表面电连接到地，从而减少外表面上的表面电荷。
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公开(公告)号：US20140346373A1
公开(公告)日：2014-11-27
申请号：US14452418
申请日：2014-08-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Chirag Rajyaguru , Peter M. Baumgart , Georgiy O. Vaschenko
CPC classification number: H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.
Abstract translation: 用于产生EUV辐射的系统（及其方法），其包括产生针对照射区域和液滴源的激光束的布置。 液滴源包括离开孔的流体和具有产生流体扰动的电致动元件的子系统。 电致动元件由第一波形驱动以产生用于照射的液滴以产生EUV辐射，由第一波形产生的具有不同初始速度的液滴导致至少一些相邻的液滴在液滴行进到照射区域时聚结， 以及与第一波形不同的第二波形，以从孔口移除污染物。
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Patent Agency Ranking
6.发明申请公开(公告)号：US20160274466A1
公开(公告)日：2016-09-22
申请号：US15168431
申请日：2016-05-31
Applicant: ASML Netherlands B.V.
Inventor： Silvia De Dea , Georgiy O. Vaschenko , Peter Baumgart , Norbert Bowering
CPC classification number: G03F7/70033 , C23C14/185 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.
Abstract translation: 用于极紫外（EUV）光源的目标材料供应装置包括管，其包括限定在第一和第二端之间的第一端，第二端和侧壁。 管的外表面的至少一部分包括电绝缘材料，第一端容纳加压目标材料，第二端限定出加压目标材料通过的孔，以产生目标材料液滴流。 目标材料供应装置还包括在管的外表面上的导电涂层。 涂层被配置为将管的外表面电连接到地，从而减少外表面上的表面电荷。
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公开(公告)号：US20180368242A1
公开(公告)日：2018-12-20
申请号：US15962307
申请日：2018-04-25
Applicant: ASML Netherlands B.V.
Inventor： Koen Gerhardus Winkels , Georgiy O. Vaschenko , Theodorus Wilhelmus Driessen , Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Wilhelmus Henricus Theodorus Maria Aangenent
Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.
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公开(公告)号：US08969840B2
公开(公告)日：2015-03-03
申请号：US14452418
申请日：2014-08-05
Applicant: ASML Netherlands B.V.
Inventor： Chirag Rajyaguru , Peter M. Baumgart , Georgiy O. Vaschenko
CPC classification number: H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.
Abstract translation: 用于产生EUV辐射的系统（及其方法），其包括产生针对照射区域和液滴源的激光束的布置。 液滴源包括离开孔的流体和具有产生流体扰动的电致动元件的子系统。 电致动元件由第一波形驱动以产生用于照射的液滴以产生EUV辐射，由第一波形产生的具有不同初始速度的液滴导致至少一些相邻的液滴在液滴行进到照射区域时聚结， 以及与第一波形不同的第二波形，以从孔口移除污染物。
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公开(公告)号：US20140264093A1
公开(公告)日：2014-09-18
申请号：US14294048
申请日：2014-06-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Georgiy O. Vaschenko
CPC classification number: H05H1/42 , G03F7/70033 , H01J35/20 , H05G2/005 , H05G2/006 , H05G2/008 , Y10T29/49 , Y10T156/10
Abstract: Methods and apparatus for producing irradiation targets in an extreme ultraviolet (EUV) light source having an irradiation target generating system that includes a nozzle configured for ejecting droplets of a target material, and a subsystem having an electro-actuable element producing a modulation waveform to cause disturbance to the droplets thereby causing at least some of the droplets to coalesce into irradiation targets. There is included a laser producing a beam for irradiating the irradiation targets to generate an EUV-producing plasma, wherein the electro-actuable element is biased against the nozzle to enable transfer of the disturbance to the droplets while permitting relative movement between the electro-actuable element and the nozzle.
Abstract translation: 在具有包括喷射目标材料的液滴的喷嘴的照射目标产生系统的极紫外（EUV）光源中产生照射靶的方法和装置以及具有产生调制波形的电致动元件的子系统， 对液滴的干扰，从而使至少一些液滴聚结成辐射靶。 包括产生用于照射照射目标以产生产生EUV的等离子体的光束的激光，其中电致动元件被偏置在喷嘴上，以使干扰能够传递到液滴，同时允许电致动的等离子体之间的相对运动 元件和喷嘴。
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公开(公告)号：US10904994B2
公开(公告)日：2021-01-26
申请号：US16671348
申请日：2019-11-01
Applicant: ASML Netherlands B.V.
Inventor： Koen Gerhardus Winkels , Georgiy O. Vaschenko , Theodorus Wilhelmus Driessen , Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Wilhelmus Henricus Theodorus Maria Aangenent
Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.
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