公开(公告)号：US20140291879A1

公开(公告)日：2014-10-02

申请号：US14304662

申请日：2014-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela KRUIJT-STEGEMAN ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

IPC: B29C59/02

CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract translation: 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。