公开(公告)号：US09889597B2

公开(公告)日：2018-02-13

申请号：US14076793

申请日：2013-11-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Wilhelmus Knaapen ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Ivar Schram ,  Raymond Wilhelmus Louis Lafarre

IPC: B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C59/02

CPC classification number: B29C59/002 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

公开(公告)号：US09610727B2

公开(公告)日：2017-04-04

申请号：US14304662

申请日：2014-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Johan Frederik Dijksman ,  Aleksey Yurievich Kolesnychenko ,  Karel Diederick Van Der Mast ,  Klaus Simon ,  Raymond Jacobus Wilhelmus Knaapen ,  Krassimir Todorov Krastev ,  Sander Frederik Wuister

IPC: B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C35/08

CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

公开(公告)号：US20180162040A1

公开(公告)日：2018-06-14

申请号：US15865242

申请日：2018-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Wilhelmus Knaapen ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Ivar Schram ,  Raymond Wilhelmus Louis Lafarre

IPC: B29C59/00 ,  B29C59/02 ,  G03F7/00 ,  B82Y40/00 ,  B82Y10/00

CPC classification number: B29C59/002 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

公开(公告)号：US10654217B2

公开(公告)日：2020-05-19

申请号：US15865242

申请日：2018-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Wilhelmus Knaapen ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Ivar Schram ,  Raymond Wilhelmus Louis Lafarre

IPC: B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C59/02

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.