公开(公告)号：US09823576B2

公开(公告)日：2017-11-21

申请号：US14165334

申请日：2014-01-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Dries Smeets ,  Arno Jan Bleeker ,  Christopher James Lee ,  Pieter Willem Herman De Jager ,  Heine Melle Mulder ,  Rudy Jan Maria Pellens

IPC: G03B27/72 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70291

Abstract: A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.