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公开(公告)号：US10295916B2
公开(公告)日：2019-05-21
申请号：US15961399
申请日：2018-04-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle Mulder , Andrey Sergeevich Tychkov , Willem Van Schaik
Abstract: Disclosed is a radiation source module and a radiation collector for the module with the radiation collector comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer, with the plurality of holes forming vertices of a grid substantially covering the surface, and wherein the coating may comprise multiple layers.
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公开(公告)号：US09778575B2
公开(公告)日：2017-10-03
申请号：US14988944
申请日：2016-01-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen , Patricius Aloysius Jacobus Tinnemans , Wilfred Edward Endendijk
CPC classification number: G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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公开(公告)号：US09651875B2
公开(公告)日：2017-05-16
申请号：US14709135
申请日：2015-05-11
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GmbH
Inventor： Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
CPC classification number: G03F7/70566 , G03F7/70091 , G03F7/70116
Abstract: An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
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公开(公告)号：US10222703B2
公开(公告)日：2019-03-05
申请号：US15653380
申请日：2017-07-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen , Patricius Aloysius Jacobus Tinnemans , Wilfred Edward Endendijk
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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公开(公告)号：US09823576B2
公开(公告)日：2017-11-21
申请号：US14165334
申请日：2014-01-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Dries Smeets , Arno Jan Bleeker , Christopher James Lee , Pieter Willem Herman De Jager , Heine Melle Mulder , Rudy Jan Maria Pellens
CPC classification number: G03F7/70191 , G03F7/70291
Abstract: A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.
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Patent Agency Ranking
公开(公告)号：US20150034788A1
公开(公告)日：2015-02-05
申请号：US14382228
申请日：2013-01-30
Applicant: ASML Netherlands B.V.
Inventor： Arno Jan Bleeker , Thomas Josephus Maria Castenmill , Pieter Willem Herman De Jager , Heine Melle Mulder , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Danny Maria Hubertus Philips , Ruud Antonius Catharina Maria Beere , Roger Anton Marie Timmermans
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/20 , G03F7/7005 , G03F7/70075 , G03F7/70275 , G03F7/70291 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70475
Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.
Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止在由可旋转框架保持的镜片上施加力矩。
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公开(公告)号：US10394143B2
公开(公告)日：2019-08-27
申请号：US15764617
申请日：2016-09-06
Applicant: ASML Netherlands B.V.
Inventor： Nitesh Pandey , Arie Jeffrey Den Boef , Heine Melle Mulder , Willem Richard Pongers , Paulus Antonius Andreas Teunissen
Abstract: A topography measurement system comprising a radiation source configured to generate a radiation beam, a spatially coded grating configured to pattern the radiation beam and thereby provide a spatially coded radiation beam, optics configured to form an image of the spatially coded grating at a target location on a substrate, detection optics configured to receive radiation reflected from the target location of the substrate and form an image of the grating image at a second grating, and a detector configured to receive radiation transmitted through the second grating and produce an output signal.
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公开(公告)号：US20220350181A1
公开(公告)日：2022-11-03
申请号：US17762982
申请日：2020-09-17
Applicant: ASML Netherlands B.V.
Abstract: An optical modulator includes an acousto-optic assembly and a thermal management apparatus. The acousto-optic assembly includes: an acousto-optic material; a first side configured to receive an incident light beam; and a second side configured to emit an output light beam based on the incident light beam. The thermal management apparatus includes: a first thermally conductive material in thermal contact with the first side of the acousto-optic assembly; and a second thermally conductive material in thermal contact with the second side of the acousto-optic assembly.
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9.发明授权公开(公告)号：US09715183B2
公开(公告)日：2017-07-25
申请号：US14365549
申请日：2013-01-24
Applicant: ASML Netherlands B.V.
Inventor： Wouter Dick Koek , Arno Jan Bleeker , Erik Roelof Loopstra , Heine Melle Mulder , Erwin John Van Zwet , Dries Smeets , Robert Paul Ebeling
CPC classification number: G03F7/70891 , G02B6/4296 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704 , Y10T29/49
Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.
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10.发明申请DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DEVICE MANUFACTURING METHOD 有权设备，光刻设备，用于引导辐射的方法和设备制造方法公开(公告)号：US20140347641A1
公开(公告)日：2014-11-27
申请号：US14365549
申请日：2013-01-24
Applicant: ASML Netherlands B.V.
Inventor： Wouter Dick Koek , Arno Jan Bleeker , Erik Roelof Loopstra , Heine Melle Mulder , Erwin John Van Zwet , Dries Smeets , Robert Paul Ebeling
IPC: G03F7/20
CPC classification number: G03F7/70891 , G02B6/4296 , G03F7/7015 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704 , Y10T29/49
Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.
Abstract translation: 一种具有波导形成的波导的器件，所述波导由穿过所述波导的辐射透明的材料的连续体形成，其中所述主体具有输入表面和输出表面，以及冷却器，被配置为冷却所述输入表面和/或输出表面 。 一种具有可编程图案形成装置的曝光装置，包括多个辐射发射器，被配置为提供多个辐射束; 以及投影系统，包括固定部分和移动部分，其被配置为将所述多个辐射束投影到基于图案被选择的目标上的位置上，其中所述辐射发射器中的至少一个包括波导，所述波导被配置为输出 包括非偏振和/或圆偏振辐射的辐射束。
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