公开(公告)号：US10690812B2

公开(公告)日：2020-06-23

申请号：US14854784

申请日：2015-09-15

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Hermanus Hendricus Petrus Theodorus Bekman ,  Dirk Heinrich Ehm ,  Jeroen Huijbregtse ,  Arnoldus Jan Storm ,  Tina Graber ,  Irene Ament ,  Dries Smeets ,  Edwin Te Sligte ,  Alexey Kuznetsov

IPC: G02B1/14 ,  G02B5/08 ,  G21K1/06 ,  G03F7/20 ,  C23C16/56

Abstract: An optical element (50), comprising: a substrate (52), an EUV radiation reflecting multilayer system (51) applied to the substrate, and a protective layer system (60) applied to the multilayer system and having at least a first and a second layer (57, 58). The first layer (57) is arranged closer to the multilayer system (51) than is the second layer (58) and serves as a diffusion barrier for hydrogen. This first layer (57) has a lower solubility for hydrogen than does the second layer (58), which serves for absorbing hydrogen. Also disclosed are an optical system for EUV lithography with at least one such optical element, and a method for treating an optical element in order to remove hydrogen incorporated in at least one layer (57, 58, 59) of the protective layer system and/or in at least one layer (53, 54) of the multilayer system (51).

公开(公告)号：US09823576B2

公开(公告)日：2017-11-21

申请号：US14165334

申请日：2014-01-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Dries Smeets ,  Arno Jan Bleeker ,  Christopher James Lee ,  Pieter Willem Herman De Jager ,  Heine Melle Mulder ,  Rudy Jan Maria Pellens

IPC: G03B27/72 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70291

Abstract: A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.

公开(公告)号：US09715183B2

公开(公告)日：2017-07-25

申请号：US14365549

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Wouter Dick Koek ,  Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Heine Melle Mulder ,  Erwin John Van Zwet ,  Dries Smeets ,  Robert Paul Ebeling

IPC: G03B27/52 ,  G03F7/20 ,  G02B6/42

CPC classification number: G03F7/70891 ,  G02B6/4296 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  Y10T29/49

Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

公开(公告)号：US20140347641A1

公开(公告)日：2014-11-27

申请号：US14365549

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Wouter Dick Koek ,  Arno Jan Bleeker ,  Erik Roelof Loopstra ,  Heine Melle Mulder ,  Erwin John Van Zwet ,  Dries Smeets ,  Robert Paul Ebeling

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G02B6/4296 ,  G03F7/7015 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704 ,  Y10T29/49

Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

Abstract translation: 一种具有波导形成的波导的器件，所述波导由穿过所述波导的辐射透明的材料的连续体形成，其中所述主体具有输入表面和输出表面，以及冷却器，被配置为冷却所述输入表面和/或输出表面 。 一种具有可编程图案形成装置的曝光装置，包括多个辐射发射器，被配置为提供多个辐射束; 以及投影系统，包括固定部分和移动部分，其被配置为将所述多个辐射束投影到基于图案被选择的目标上的位置上，其中所述辐射发射器中的至少一个包括波导，所述波导被配置为输出 包括非偏振和/或圆偏振辐射的辐射束。