公开(公告)号：US20190204750A1

公开(公告)日：2019-07-04

申请号：US16325767

申请日：2017-08-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Daimian WANG ,  Shengrui ZHANG ,  Chi-Hsiang FAN

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/705 ,  G03F7/70508 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7046

Abstract: A method including performing a first simulation for each of a plurality of different metrology target measurement recipes using a first model, selecting a first group of metrology target measurement recipes from the plurality of metrology target measurement recipes, the first group of metrology target measurement recipes satisfying a first rule, performing a second simulation for each of the metrology target measurement recipes from the first group using a second model, and selecting a second group of metrology target measurement recipes from the first group, the second group of metrology target measurement recipes satisfying a second rule, the first model being less accurate or faster than the second model and/or the first rule being less restrictive than the second rule.