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公开(公告)号：US20210356873A1
公开(公告)日：2021-11-18
申请号：US17277583
申请日：2019-09-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Arie Jeffrey DEN BOEF , Kaustuve BHATTACHARYYA , Kenji MORISAKI , Simon Gijsbert MATHIJSSEN
IPC: G03F7/20
Abstract: A method to measure a parameter of a manufacturing process, the method including illuminating a target with radiation, detecting scattered radiation from the target, and determining the parameter of interest from an asymmetry of the detected radiation.
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