公开(公告)号：US20240183806A1

公开(公告)日：2024-06-06

申请号：US18284824

申请日：2022-03-04

Applicant: ASML Netherlands B.V.

Inventor： Te-Sheng WANG ,  Szu-Po WANG ,  Tsung-Hsien LIU ,  Yung-Huan HSIEH

IPC: G01N23/2251

CPC classification number: G01N23/2251 ,  G01N2223/305 ,  G01N2223/6116

Abstract: Apparatuses, systems, and methods for determining local focus points (LFPs) on a sample are provided. In some embodiments, a controller including circuitry may be configured to cause a system to perform selecting a first plurality of resist pattern designs; performing a plurality of process simulations using the first plurality of resist pattern designs; identifying a hotspot that corresponds to a resist pattern design based on results of the performed process simulations; determining focus-related characteristics that correspond to a plurality of candidate resist patterns, wherein the plurality of candidate resist pattern designs is a subset of the first plurality of resist pattern designs and the subset is selected based on the identified hotspot; and determining locations of a plurality of LFPs based on the generated focus-related characteristics.

公开(公告)号：US20240355578A1

公开(公告)日：2024-10-24

申请号：US18761319

申请日：2024-07-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Te-Sheng WANG ,  Szu-Po WANG ,  Kai-Yuan CHI

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/28

Abstract: Disclosed are non-transitory computer-readable media, systems, and computer-implemented methods that describe obtaining hot spot (HS) location information with respect to a printed pattern; obtaining LFP search criteria for searching the printed pattern to determine a local focus point (LFP) for an imaging device; selecting a HS area in the printed pattern that contains a HS; and determining the LFP proximate to the HS area based on the LFP search criteria, the LFP not containing the HS.