公开(公告)号：US20040165160A1

公开(公告)日：2004-08-26

申请号：US10733771

申请日：2003-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Michael Cornelis Van Beek ,  Levinus Pieter Bakker ,  Theodorus Hubertus Josephus Bisschops ,  Jeroen Jonkers ,  Mark Kroon ,  Robertus Adrianus Maria Wolters ,  Adrianus Johannes Henricus Maas

IPC: G03B027/52

CPC classification number: G03F7/70925 ,  B08B7/0057

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.

Abstract translation: 公开了一种光刻投影装置。 该装置包括构造成支撑图形结构的支撑结构。 图形结构适于根据期望的图案对辐射束进行图案化。 该装置还包括被构造成保持基板的基板保持器，被构造和布置成将图案化的光束投影到基板的目标部分上的投影系统，以及连接到气体源的下游自由基源，并且是 被配置为在待清洁的表面上提供自由基束。