公开(公告)号：US20040227102A1

公开(公告)日：2004-11-18

申请号：US10783087

申请日：2004-02-23

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT AG

Inventor： Ralph Kurt ,  Michael Cornelis Van Beek ,  Antonie Ellert Duisterwinkel ,  Erik Rene Kieft ,  Hans Meiling ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Bastiaan Theodoor Wolschrijn

IPC: G01N021/00

CPC classification number: G03F7/70916 ,  G01N21/95684

Abstract: A measuring device for determining contamination of a surface of a component in an lithographic projection apparatus. The measuring device includes a radiation transmitter for transmitting radiation on at least a part of the surface and a radiation receiver for receiving radiation from the component. A processor is communicatively connected to the receiver, for deriving a property of received radiation and deriving a property of the contamination from the property of received radiation.

Abstract translation: 一种用于确定光刻投影装置中部件的表面污染的测量装置。 测量装置包括用于在表面的至少一部分上传送辐射的辐射发射器和用于接收来自部件的辐射的辐射接收器。 处理器通信地连接到接收器，用于从接收到的辐射的性质导出接收的辐射的属性并导出污染的属性。

公开(公告)号：US20040165160A1

公开(公告)日：2004-08-26

申请号：US10733771

申请日：2003-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Michael Cornelis Van Beek ,  Levinus Pieter Bakker ,  Theodorus Hubertus Josephus Bisschops ,  Jeroen Jonkers ,  Mark Kroon ,  Robertus Adrianus Maria Wolters ,  Adrianus Johannes Henricus Maas

IPC: G03B027/52

CPC classification number: G03F7/70925 ,  B08B7/0057

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a support structure constructed to support a patterning structure. The patterning structure is adapted to pattern a beam of radiation according to a desired pattern. The apparatus also includes a substrate holder that is constructed to hold a substrate, a projection system that is constructed and arranged to project the patterned beam onto a target portion of the substrate, and a downstream radical source that is connected to a gas supply and is configured to provide a beam of radicals onto a surface to be cleaned.

Abstract translation: 公开了一种光刻投影装置。 该装置包括构造成支撑图形结构的支撑结构。 图形结构适于根据期望的图案对辐射束进行图案化。 该装置还包括被构造成保持基板的基板保持器，被构造和布置成将图案化的光束投影到基板的目标部分上的投影系统，以及连接到气体源的下游自由基源，并且是 被配置为在待清洁的表面上提供自由基束。