公开(公告)号：US20240241436A1

公开(公告)日：2024-07-18

申请号：US18289384

申请日：2022-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Xingyue PENG ,  Rafael C. HOWELL ,  Yen Wen LU ,  Xiaorui CHEN

IPC: G03F1/84 ,  G03F1/36 ,  G06F30/20

CPC classification number: G03F1/84 ,  G06F30/20 ,  G03F1/36

Abstract: Methods and systems for determining a mask rule check violation (MRC) associated with a mask feature using a detector having geometric properties corresponding to the MRC. The detector (e.g., elliptical shaped) is configured to include a curved portion to detect a curvature violation, include an enclosed area (e.g., a fully enclosed area or a partially enclosed area having an opening), include a predefined orientation axis configured to guide relative positioning of the detector with a mask feature, and include a length to detect a critical dimension violation. The orientation axis of the detector is aligned with a normal axis at a location on the mask feature. Based on the orientation axis aligned with the normal axis of the mask feature, an MRC violation is determined corresponding to a region of the mask feature that intersects the enclosed area.