专利检索 ap:("ASML Netheriands B. V." OR "ASML Holding N.V.") AND inv:"Sergel SOKOLOV" 第 1 页

1.

发明公开
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF 审中-公开

公开(公告)号：US20240036485A1

公开(公告)日：2024-02-01

申请号：US18269191

申请日：2021-12-02

申请人： ASML Netheriands B. V. , ASML Holding N.V.

发明人： Arjan Johannes Anton BEUKMAN , Sebastianus Adrianus GOORDEN , Stephen ROUX , Sergel SOKOLOV , Filippo ALPEGGIANI

IPC分类号： G03F9/00 , G03F7/00

CPC分类号： G03F9/7065 , G03F7/70625 , G03F9/7046

摘要： A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.