Patent search ap:("ASML Netherlands B.V.") AND inv:"Alex Pascal Ten Brink" Page 1

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发明授权
Method to obtain a height map of a substrate having alignment marks, substrate alignment measuring apparatus and lithographic apparatus 有权

公开(公告)号：US11307507B2

公开(公告)日：2022-04-19

申请号：US16630668

申请日：2018-06-05

Applicant: ASML Netherlands B.V.

Inventor： Bram Van Hoof , Arjan Hölscher , Alex Pascal Ten Brink , Petrus Franciscus Van Gils

IPC: G03F7/20 , G03F9/00

Abstract: The present invention provides a method to obtain a height map of a substrate having alignment marks, the method comprising the steps: determining a height of one or more locations or areas of the substrate, and determining the height map of the substrate on the basis of the determined height of the one or more locations or areas of the substrate and a shape model of the substrate.

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