公开(公告)号：US11307507B2

公开(公告)日：2022-04-19

申请号：US16630668

申请日：2018-06-05

申请人： ASML Netherlands B.V.

发明人： Bram Van Hoof ,  Arjan Hölscher ,  Alex Pascal Ten Brink ,  Petrus Franciscus Van Gils

IPC分类号： G03F7/20 ,  G03F9/00

摘要： The present invention provides a method to obtain a height map of a substrate having alignment marks, the method comprising the steps: determining a height of one or more locations or areas of the substrate, and determining the height map of the substrate on the basis of the determined height of the one or more locations or areas of the substrate and a shape model of the substrate.

公开(公告)号：US10915033B2

公开(公告)日：2021-02-09

申请号：US15779758

申请日：2016-11-17

申请人： ASML NETHERLANDS B.V.

发明人： Bram Van Hoof ,  Jeroen Cottaar

IPC分类号： G03F9/00 ,  G03F7/20

摘要： Combination of a stage and a level sensor configured to sense a height level at a target location on an object is described, the stage comprising an object table configured to hold the object and a positioning device for displacing the object table relative to the level sensor in a first direction, the level sensor comprising a projection system configured to project a measurement beam onto a measurement area of the object, the measurement area having a measurement area length in the first direction, a detector system configured to receive different portions of the measurement beam after being reflected off different sub-areas within the measurement area, the different sub-areas being arranged in the first direction, and to supply output signals representative of the different portions received, a signal processing system configured to process the output signals from the detector system.

公开(公告)号：US10289009B2

公开(公告)日：2019-05-14

申请号：US15736142

申请日：2016-06-02

申请人： ASML Netherlands B.V.

发明人： Bram Van Hoof ,  Wim Tjibbo Tel

IPC分类号： G03F7/20 ,  G03F9/00

摘要： A lithographic apparatus obtains a height map of a substrate and uses the height map when controlling imaging of the pattern to the substrate. The apparatus is arranged to disregard at least partially height anomalies when controlling the imaging. The height anomalies may be identified by processing the height map. For example, in some embodiments the height anomalies are identified using a shape recognition model. In some embodiments, a modified version of the height map is produced in which the height anomalies are at least partially removed, and the modified version of the height map is used in controlling the imaging. An anomaly map may be used together with the (unmodified) height map to control imaging.