公开(公告)号：US20190080811A1

公开(公告)日：2019-03-14

申请号：US16186993

申请日：2018-11-12

Applicant: ASML Netherlands B.V.

Inventor： Alexander I. ERSHOV ,  John Tom Stewart, IV ,  Igor V. FOMENKOV ,  Christianus W.J. BERENDSEN

IPC: G21K1/06 ,  H05G2/00

Abstract: Disclosed is an EUV system in which a source control loop is established to maintain and optimize debris flux while not unduly affecting optimum EUV generation conditions. One or more temperature sensors, e.g., thermocouples may be installed in the vessel to measure respective local gas temperatures. The respective local temperature as measured by the one or more thermocouples can be used as one or more inputs to the source control loop. The source control loop may then adjust the laser targeting to permit optimization of debris generation and deposition while not affecting EUV production, thus extending the lifetime of the source and its collector.

公开(公告)号：US20160161855A1

公开(公告)日：2016-06-09

申请号：US15011218

申请日：2016-01-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexander I. ERSHOV

IPC: G03F7/20

CPC classification number: G03F7/70008 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70341 ,  G03F7/70875

Abstract: Apparatus for and method of temperature compensating a focusing system in which the focusing system has at least one transmissive optical element having a thermal lens. A reflective optical element is added to the system that has a thermal lens that is complementary to the thermal lens of the transmissive optical element so that the optical characteristics of the two optical elements combined are substantially temperature independent. The respective thermal lenses of the two optical elements are balanced by selecting materials for the reflective optical element that have the correct optical absorption based on the absorption of the transmissive optical element and the relative strengths of the thermal lenses. Provision can also be made for a change in the absorption of the transmissive optical element over time by selecting a value for the absorption of the reflective optical element that exceeds a contemporaneous value for the absorption of the transmissive optical element and then cooling the reflective optical element to reduce the strength of its thermal lens, with provision for increasing the temperature of the reflective optical component over time. The focusing system may also include a pulse combiner for combing pulses from multiple sources. The focusing system is especially applicable to systems for generating EUV light for use in semiconductor photolithography.

Abstract translation: 聚焦系统的温度补偿装置和方法，其中聚焦系统具有至少一个具有热透镜的透射光学元件。 反射光学元件被添加到具有与透射光学元件的热透镜互补的热透镜的系统中，使得组合的两个光学元件的光学特性基本上是温度无关的。 通过根据透射光学元件的吸收和热透镜的相对强度选择具有正确的光吸收的反射型光学元件的材料来平衡两个光学元件的各个热透镜。 还可以通过选择反射光学元件的吸收值超过透射光学元件的吸收的同时值，然后冷却反射光学元件，来改变透射光学元件的吸收的变化 以降低其热透镜的强度，同时随着时间的推移提高反射光学部件的温度。 聚焦系统还可以包括用于梳理来自多个源的脉冲的脉冲组合器。 聚焦系统特别适用于在半导体光刻中使用的用于产生EUV光的系统。

公开(公告)号：US20160091803A1

公开(公告)日：2016-03-31

申请号：US14964319

申请日：2015-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexander I. ERSHOV

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70216 ,  G03F7/70975

Abstract: Method of and apparatus for repairing an optical element disposed in a vacuum chamber while the optical element is in the vacuum chamber. An exposed surface of the optical element is exposed to an ion flux generated by an ion source to remove at least some areas of the surface that have been damaged by exposure to the environment within the vacuum chamber. The method and apparatus are especially applicable to repair multilayer mirrors serving as collectors in systems for generating EUV light for use in semiconductor photolithography.

Abstract translation: 在光学元件位于真空室中时修复设置在真空室中的光学元件的方法和装置。 光学元件的暴露表面暴露于由离子源产生的离子通量，以去除通过暴露于真空室内的环境而损坏的表面的至少一些区域。 该方法和装置特别适用于在用于生成用于半导体光刻中的EUV光的系统中用作收集器的多层反射镜。