公开(公告)号：US20190080811A1

公开(公告)日：2019-03-14

申请号：US16186993

申请日：2018-11-12

Applicant: ASML Netherlands B.V.

Inventor： Alexander I. ERSHOV ,  John Tom Stewart, IV ,  Igor V. FOMENKOV ,  Christianus W.J. BERENDSEN

IPC: G21K1/06 ,  H05G2/00

Abstract: Disclosed is an EUV system in which a source control loop is established to maintain and optimize debris flux while not unduly affecting optimum EUV generation conditions. One or more temperature sensors, e.g., thermocouples may be installed in the vessel to measure respective local gas temperatures. The respective local temperature as measured by the one or more thermocouples can be used as one or more inputs to the source control loop. The source control loop may then adjust the laser targeting to permit optimization of debris generation and deposition while not affecting EUV production, thus extending the lifetime of the source and its collector.