SOURCE MATERIAL DELIVERY SYSTEM, EUV RADIATION SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

    公开(公告)号:US20230010985A1

    公开(公告)日:2023-01-12

    申请号:US17782696

    申请日:2020-12-02

    Abstract: A method includes ejecting initial droplets of a material using a nozzle. The method includes applying a pressure on the nozzle using an electromechanical element. The method includes controlling the applied pressure on the nozzle using an electrical signal generated by a waveform generator. The electrical signal includes a first periodic waveform and a second periodic waveform. The method includes coalescing the initial droplets to generate coalesced droplets based on the first and second periodic waveforms and drag. The method includes generating a detection signal, using a detector, corresponding to time intervals between crossings of coalesced droplets at the detector. The method includes determining at least first and second ones of the time intervals using a processor.

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