公开(公告)号：US20240153732A1

公开(公告)日：2024-05-09

申请号：US18281272

申请日：2022-02-09

Applicant: ASML Netherlands B.V.

Inventor： Datong ZHANG ,  Chih-hung WANG ,  Oliver Desmond PATTERSON ,  Xiaohu TANG

IPC: H01J37/147 ,  H01J37/26

CPC classification number: H01J37/1474 ,  H01J37/263 ,  H01J37/265 ,  H01J2237/0048 ,  H01J2237/24592

Abstract: Apparatuses, systems, and methods for providing beams for using deflector control to control charging on a sample surface of charged particle beam systems. In some embodiments, a controller including circuitry configured to scan a plurality of nodes of the sample to charge the plurality of nodes; adjust a scan rate of a beam such that a quantity of charge deposited on each node of the plurality of nodes varies with respect to at least one other node; generate a plurality of images; and compare the plurality of images to enable detection of a defect associated with any of the plurality of nodes of the sample.