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公开(公告)号:US20240153732A1
公开(公告)日:2024-05-09
申请号:US18281272
申请日:2022-02-09
Applicant: ASML Netherlands B.V.
Inventor: Datong ZHANG , Chih-hung WANG , Oliver Desmond PATTERSON , Xiaohu TANG
IPC: H01J37/147 , H01J37/26
CPC classification number: H01J37/1474 , H01J37/263 , H01J37/265 , H01J2237/0048 , H01J2237/24592
Abstract: Apparatuses, systems, and methods for providing beams for using deflector control to control charging on a sample surface of charged particle beam systems. In some embodiments, a controller including circuitry configured to scan a plurality of nodes of the sample to charge the plurality of nodes; adjust a scan rate of a beam such that a quantity of charge deposited on each node of the plurality of nodes varies with respect to at least one other node; generate a plurality of images; and compare the plurality of images to enable detection of a defect associated with any of the plurality of nodes of the sample.
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2.
公开(公告)号:US20230335374A1
公开(公告)日:2023-10-19
申请号:US18019088
申请日:2021-07-27
Applicant: ASML Netherlands B.V.
Inventor: Benoit Herve GAURY , Jun JIANG , Bruno LA FONTAINE , Shakeeb Bin HASAN , Kenichi KANAI , Jasper Frans Mathijs VAN RENS , Cyrus Emil TABERY , Long MA , Oliver Desmond PATTERSON , Jian ZHANG , Chih-Yu JEN , Yixiang WANG
IPC: H01J37/26 , G01N23/2251 , H01J37/244 , H01J37/22
CPC classification number: H01J37/265 , G01N23/2251 , H01J37/244 , H01J37/228 , H01J2237/2482
Abstract: Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged-particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.
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