公开(公告)号：US11875966B2

公开(公告)日：2024-01-16

申请号：US17403006

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bernardo Kastrup ,  Johannes Catharinus Hubertus Mulkens ,  Marinus Aart Van Den Brink ,  Jozef Petrus Henricus Benschop ,  Erwin Paul Smakman ,  Tamara Druzhinina ,  Coen Adrianus Verschuren

IPC: H01J37/26 ,  H01J37/15 ,  H01J37/02 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/263 ,  H01J37/023 ,  H01J37/15 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/2817

Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

公开(公告)号：US20180374673A1

公开(公告)日：2018-12-27

申请号：US15780678

申请日：2016-01-29

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shuhei YABU

IPC: H01J37/26 ,  H01J37/12 ,  H01J37/28 ,  H01J37/147 ,  H01J37/21 ,  H01J37/141

CPC classification number: H01J37/263 ,  H01J37/12 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/1475 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/152

Abstract: A charged particle beam device includes a charged particle source which emits a charged particle beam radiated on a sample; a condenser lens system which has at least one condenser lens focusing the charged particle beam at a predetermined demagnification; a deflector which is positioned between a condenser lens of a most downstream side and a charged particle source in the condenser lens system, and moves a virtual position of the charged particle source; and a control unit which controls the deflector and the condenser lens system. The control unit controls the deflector to move the virtual position of the charged particle source to a position of suppressing a deviation, which is caused by a change of the demagnification of the condenser lens system, of a center trajectory of the charged particle beam in the downstream of the condenser lens system.

公开(公告)号：US20180254169A1

公开(公告)日：2018-09-06

申请号：US15971896

申请日：2018-05-04

Applicant: FEI Company

Inventor： Alexander Henstra ,  Peter Christiaan Tiemeijer

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/14 ,  H01J37/22 ,  H01J37/05

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/14 ,  H01J37/22 ,  H01J37/26 ,  H01J37/263 ,  H01J2237/053 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/2802

Abstract: A method of operating a Post Column Filter (PCF) in a Scanning/Transmission Electron Microscope, and a Post Column Filter configured to operate according to the method. In an embodiment, the method includes receiving, at an entrance plane, an incoming beam of electrons; dispersing, by an energy dispersive element, the incoming beam of electrons into an energy dispersed beam of electrons; disposing a first plurality of quadrupoles between the entrance plane and a slit plane; operating the PCF in an EELS mode; and operating the PCF in an EFTEM mode. Operating the PCF in an EELS mode includes exciting one or more quadrupoles of the first plurality of quadrupoles at a first excitation level, wherein the first excitation level does not enlarge the energy dispersion of the energy dispersed beam of electrons; and forming an image of the energy dispersed beam of electrons on the image plane, the image being an EELS spectrum. Operating the PCF in the EFTEM mode includes including a slit at the slit plane in an optical path; exciting one or more quadrupoles of the first plurality of quadrupoles at a second excitation level, the second excitation level different from the first excitation level; forming an energy dispersed focus of the energy dispersed beam of electrons on the slit at the slit plane; and enlarging the energy dispersion of the energy dispersed beam of electrons caused by the energy dispersive element based on the one or more first plurality quadrupoles excited at the second excitation level.

公开(公告)号：US09934936B2

公开(公告)日：2018-04-03

申请号：US14884520

申请日：2015-10-15

Applicant: FEI Company

Inventor： Pavel Potocek ,  Franciscus Martinus Henricus Maria van Laarhoven ,  Faysal Boughorbel ,  Remco Schoenmakers ,  Peter Christiaan Tiemeijer

IPC: H01J37/21 ,  H01J37/28 ,  H01J37/26

CPC classification number: H01J37/21 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/216 ,  H01J2237/2802

Abstract: A Charged Particle Microscope includes A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; and A detector, for detecting a flux of radiation emanating from the specimen in response to said irradiation. The illuminator includes: An aperture plate comprising an aperture region in a path of said beam, for defining a geometry of the beam prior to its impingement upon said specimen. The aperture region includes a distribution of multiple holes, each of which is smaller than a diameter of the beam incident on the aperture plate.

公开(公告)号：US20170338078A1

公开(公告)日：2017-11-23

申请号：US15601547

申请日：2017-05-22

Applicant: TESCAN Brno, s.r.o.

Inventor： Jaroslav Jiruse ,  Filip Lopour ,  Milos Havelka ,  Jan Polster ,  Josef Rysavka ,  Martin Zadrazil

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/141 ,  H01J37/28 ,  H01J37/12

CPC classification number: H01J37/263 ,  H01J37/04 ,  H01J37/12 ,  H01J37/141 ,  H01J37/1475 ,  H01J37/28 ,  H01J2237/04922

Abstract: A scanning electron microscope comprises three objective lenses, including a distant objective lens and a close objective lens, which are of conventional type, and an immersion objective lens of the immersion type below the distant objective lens and the close objective lens. These three objective lenses can be controlled independently, therefor different combinations of active objective lenses can be achieved. The scanning electron microscope therefore offers various imaging modes. There is a possibility to switch between these imaging modes and therefore, choose the most suitable way of imaging for given application.

公开(公告)号：US20170336335A1

公开(公告)日：2017-11-23

申请号：US15600910

申请日：2017-05-22

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Christian Hendrich ,  Bernd Schindler

IPC: G01N23/225 ,  G01N23/04 ,  H01J37/22 ,  H01J37/28

CPC classification number: G01N23/2251 ,  G01N23/04 ,  H01J37/222 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2813

Abstract: Generating an image of an object and/or a representation of data about the object uses a particle beam apparatus. The particle beam apparatus comprises at least one control unit for setting a guide unit by selecting a value of a control parameter of the control unit. A functional relationship is determined between a first control parameter value and a second control parameter value depending on the predeterminable range of a landing energy of the particles. A desired value of the landing energy is set. The value of the control parameter corresponding to the desired value of the landing energy is selected on the basis of the determined functional relationship and the guide unit is controlled using the value of the control parameter corresponding to the desired value of the landing energy.

公开(公告)号：US20170263415A1

公开(公告)日：2017-09-14

申请号：US15529281

申请日：2014-11-26

Applicant: Hitachi, Ltd.

Inventor： Daisuke BIZEN ,  Hideo MORISHITA ,  Michio HATANO ,  Hiroya OHTA

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/10 ,  H01J37/285 ,  H01J37/28 ,  H01J37/05

CPC classification number: H01J37/263 ,  H01J37/05 ,  H01J37/10 ,  H01J37/1472 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/24485 ,  H01J2237/2806 ,  H01J2237/2823

Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.

公开(公告)号：US20170243715A1

公开(公告)日：2017-08-24

申请号：US15434618

申请日：2017-02-16

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/20 ,  H01J37/29

CPC classification number: H01J37/244 ,  H01J37/20 ,  H01J37/263 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/043 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24592 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: According to one embodiment, an inspection apparatus includes an irradiation device irradiating an inspection target substrate with multiple beams, a detector detecting each of a plurality of charged particle beams formed by charged particles emitted from the inspection target substrate as an electrical signal, and a comparison processing circuitry performing pattern inspection by comparing image data of a pattern formed on the inspection target substrate, the pattern being reconstructed in accordance with the detected electrical signals, and reference image data. The detector includes a plurality of detection elements that accumulate charges, and a detection circuit that reads out the accumulated charges. The plurality of detection elements are grouped into a plurality of groups. The detection circuit operates in a manner of, during a period in which the charged particle beams are applied to the detection elements included in one group, reading out the charges accumulated in the detection elements included in one or more other groups.

公开(公告)号：US09741526B2

公开(公告)日：2017-08-22

申请号：US14912521

申请日：2014-03-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Masako Nishimura ,  Shinsuke Kawanishi ,  Hiroyuki Suzuki

IPC: H01J37/16 ,  H01J37/26 ,  H01J37/18 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/202 ,  H01J2237/28

Abstract: Disclosed is a charged particle beam apparatus wherein a partitioning film capable of transmitting a charged particle beam is provided between a charged particle optical system and a sample, said charged particle beam apparatus eliminating a contact between the sample and the partitioning film even in the cases where the sample has recesses and protrusions. On the basis of detection signals or an image generated on the basis of the detection signals, a distance between a sample and a partitioning film is monitored, said detection signals being outputted from a detector that detects secondary charged particles discharged from the sample due to irradiation of a primary charged particle beam.

公开(公告)号：US09607804B2

公开(公告)日：2017-03-28

申请号：US14745634

申请日：2015-06-22

Applicant: International Business Machines Corporation

Inventor： Rudolf M. Tromp

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/263 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2446 ,  H01J2237/2802 ,  H01J2237/2809 ,  H01J2237/2826

Abstract: Embodiments are further directed to an information processing system for generating a corrected image of a sample. The system includes a detector, a memory communicatively coupled to the detector, and a post-detection image processor communicatively coupled to the memory and the detector. The system is configured to perform a method that includes detecting, by the detector, data of a plurality of moving particles, wherein the data of the plurality of moving particles correspond to an uncorrected image of the sample, and wherein the uncorrected image includes defocus, astigmatism and spherical aberration. The method further includes generating, by the post-detection image processor, a corrected image of the sample based at least in part on processing the detected data of the plurality of moving particles.