公开(公告)号：US09869940B2

公开(公告)日：2018-01-16

申请号：US15133866

申请日：2016-04-20

Applicant: ASML Netherlands B.V.

Inventor： Si-Han Zeng ,  Yue-Lin Peng ,  Jen-Yu Fang ,  Arie Jeffrey Den Boef ,  Alexander Straaijer ,  Ching-Yi Hung ,  Patrick Warnaar

IPC: G01B11/14 ,  G03F7/20 ,  G01B11/24 ,  G01B11/27

CPC classification number: G03F7/70633 ,  G01B11/24 ,  G01B11/272

Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a different measurement combination of measurement radiation and a value for at least a first parameter; obtaining a plurality of second measurements of target asymmetry relating to a plurality of targets, each of said plurality of measurements of target asymmetry corresponding to one of said different measurement combinations, determining a relationship function describing the relationship between said first measurements and said second measurements, for each of said measurement combinations; determining, from said relationship function, a corrected overlay value, said corrected overlay value being corrected for structural contribution due to structural asymmetry in at least said first structure.

公开(公告)号：US10261427B2

公开(公告)日：2019-04-16

申请号：US15869661

申请日：2018-01-12

Applicant: ASML Netherlands B.V.

Inventor： Si-Han Zeng ,  Yue-Lin Peng ,  Jen-Yu Fang ,  Arie Jeffrey Den Boef ,  Alexander Straaijer ,  Ching-Yi Hung ,  Patrick Warnaar

IPC: G03F7/20 ,  G01B11/24 ,  G01B11/27

Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a different measurement combination of measurement radiation and a value for at least a first parameter; obtaining a plurality of second measurements of target asymmetry relating to a plurality of targets, each of said plurality of measurements of target asymmetry corresponding to one of said different measurement combinations, determining a relationship function describing the relationship between said first measurements and said second measurements, for each of said measurement combinations; determining, from said relationship function, a corrected overlay value, said corrected overlay value being corrected for structural contribution due to structural asymmetry in at least said first structure.