公开(公告)号：US10698312B2

公开(公告)日：2020-06-30

申请号：US16247179

申请日：2019-01-14

Applicant: ASML Netherlands B.V.

Inventor： Pieter-Jan Van Zwol ,  Vadim Yevgenyevich Banine ,  Jozef Petrus Henricus Benschop ,  Florian Didier Albin Dhalluin ,  Mária Péter ,  Luigi Scaccabarozzi ,  Willem Joan Van Der Zande

IPC: G03F1/62 ,  G03F1/24 ,  G02B5/20 ,  G03F7/20 ,  G02B5/18 ,  G03F1/38

Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.

公开(公告)号：US10228615B2

公开(公告)日：2019-03-12

申请号：US15320749

申请日：2015-07-02

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich Nikipelov ,  Vadim Yevgenyevich Banine ,  Jozef Petrus Henricus Benschop ,  Arjen Boogaard ,  Florian Didier Albin Dhalluin ,  Alexey Sergeevich Kuznetsov ,  Mária Péter ,  Luigi Scaccabarozzi ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Andrei Mikhailovich Yakunin

IPC: G03F1/24 ,  G03F1/38 ,  G03F1/62 ,  G06F7/20 ,  G02B5/20 ,  G03F7/20 ,  G02B5/18

Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.

公开(公告)号：US10139725B2

公开(公告)日：2018-11-27

申请号：US14775249

申请日：2014-03-04

Applicant: ASML Netherlands B.V.

Inventor： James Norman Wiley ,  Juan Diego Arias Espinoza ,  Derk Servatius Gertruda Brouns ,  Laurentius Cornelius De Winter ,  Florian Didier Albin Dhalluin ,  Pedro Julian Rizo Diago ,  Luigi Scaccabarozzi

IPC: G03B27/54 ,  G03F1/64 ,  G03F1/62 ,  G03F7/20

Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.