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公开(公告)号:US11315752B2
公开(公告)日:2022-04-26
申请号:US17118456
申请日:2020-12-10
Applicant: ASML Netherlands B.V.
Inventor: Peter Paul Hempenius , Sven Antoin Johan Hol , Maarten Frans Janus Kremers , Henricus Martinus Johannes Van De Groes , Niels Johannes Maria Bosch , Marcel Koenraad Marie Baggen
IPC: H01J37/20 , H01J37/09 , H01J37/317
Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
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公开(公告)号:US11621142B2
公开(公告)日:2023-04-04
申请号:US16992058
申请日:2020-08-12
Applicant: ASML Netherlands B.V.
Inventor: Marcel Koenraad Marie Baggen , Peter Paul Hempenius , Maarten Frans Janus Kremers , Robertus Jacobus Theodorus Van Kempen , Sven Antoin Johan Hol , Henricus Martinus Johannes Van De Groes , Johannes Hubertus Antonius Van De Rijdt , Niels Johannes Maria Bosch , Maarten Hartger Kimman
Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
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公开(公告)号:US11131937B2
公开(公告)日:2021-09-28
申请号:US16723995
申请日:2019-12-20
Applicant: ASML Netherlands B.V.
Inventor: Michaël Johannes Christiaan Ronde , Johannes Hubertus Antonius Van De Rijdt , Maarten Frans Janus Kremers , Erik Maria Rekkers
Abstract: A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.
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