公开(公告)号：US11315752B2

公开(公告)日：2022-04-26

申请号：US17118456

申请日：2020-12-10

Applicant: ASML Netherlands B.V.

Inventor： Peter Paul Hempenius ,  Sven Antoin Johan Hol ,  Maarten Frans Janus Kremers ,  Henricus Martinus Johannes Van De Groes ,  Niels Johannes Maria Bosch ,  Marcel Koenraad Marie Baggen

IPC: H01J37/20 ,  H01J37/09 ,  H01J37/317

Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

公开(公告)号：US11621142B2

公开(公告)日：2023-04-04

申请号：US16992058

申请日：2020-08-12

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie Baggen ,  Peter Paul Hempenius ,  Maarten Frans Janus Kremers ,  Robertus Jacobus Theodorus Van Kempen ,  Sven Antoin Johan Hol ,  Henricus Martinus Johannes Van De Groes ,  Johannes Hubertus Antonius Van De Rijdt ,  Niels Johannes Maria Bosch ,  Maarten Hartger Kimman

IPC: H01J37/20 ,  H01J37/28 ,  H01L21/66

Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.

公开(公告)号：US11131937B2

公开(公告)日：2021-09-28

申请号：US16723995

申请日：2019-12-20

Applicant: ASML Netherlands B.V.

Inventor： Michaël Johannes Christiaan Ronde ,  Johannes Hubertus Antonius Van De Rijdt ,  Maarten Frans Janus Kremers ,  Erik Maria Rekkers

IPC: G03B27/42 ,  G03F7/20 ,  H01L21/67

Abstract: A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.