公开(公告)号：US20160291479A1

公开(公告)日：2016-10-06

申请号：US15087299

申请日：2016-03-31

Applicant: ASML Netherlands B.V.

Inventor： Kim Gerard FEIJEN ,  Henricus Wilhelmus Maria Van Buel ,  Martinus Joseph Kok

IPC: G03F7/20 ,  G02B27/00 ,  G01B11/27 ,  G01B11/14 ,  G01B11/06 ,  G02B26/00 ,  G02B3/14

CPC classification number: G03F9/7088 ,  G01B11/0616 ,  G01B11/14 ,  G01B11/272 ,  G01N21/956 ,  G02B3/14 ,  G02B26/004 ,  G02B27/0068 ,  G03F7/706 ,  G03F7/70683 ,  G03F9/7069 ,  G03F9/7092

Abstract: An inspection apparatus (for example a scatterometer) comprises: a substrate support for supporting a substrate and an optical system. An illumination system illuminates a target (T) with radiation. A positioning system (518) moves one or both of the optical system and the substrate support so as to position an individual target (T) relative to the optical system so that the imaging optics can use a portion of the diffracted radiation to form an image of the target structure on an image sensor (23). A liquid lens (722) is controlled (902) by feed-forward control to maintain said image stationary against vibration and/or scanning movement between the optical system and the target structure. In a second aspect, a liquid lens (1324, 1363) to correct chromatic aberration during measurements made at different wavelengths. This may improve focusing of the illumination on the target (T), and/or focusing of an image on the image sensor (23).

Abstract translation: 检查装置（例如散射仪）包括：用于支撑基板的基板支撑件和光学系统。 照明系统用辐射照射目标（T）。 定位系统（518）移动光学系统和基板支撑件中的一个或两个以便相对于光学系统定位单个目标（T），使得成像光学器件可以使用衍射辐射的一部分来形成图像 的图像传感器（23）上的目标结构。 通过前馈控制来控制液体透镜（722）（902），以保持所述图像不受光学系统和目标结构之间的振动和/或扫描运动的影响。 在第二方面，一种在不同波长的测量期间校正色像差的液体透镜（1324,1363）。 这可以改善照明对目标（T）的聚焦和/或图像在图像传感器（23）上的聚焦。

公开(公告)号：US10101677B2

公开(公告)日：2018-10-16

申请号：US15087299

申请日：2016-03-31

Applicant: ASML Netherlands B.V.

Inventor： Kim Gerard Feijen ,  Henricus Wilhelmus Maria Van Buel ,  Martinus Joseph Kok

IPC: G03F7/20 ,  G03F9/00 ,  G01B11/06 ,  G01B11/14 ,  G01B11/27 ,  G02B3/14 ,  G02B26/00 ,  G02B27/00 ,  G01N21/956

Abstract: An inspection apparatus (for example a scatterometer) comprises: a substrate support for supporting a substrate and an optical system. An illumination system illuminates a target (T) with radiation. A positioning system (518) moves one or both of the optical system and the substrate support so as to position an individual target (T) relative to the optical system so that the imaging optics can use a portion of the diffracted radiation to form an image of the target structure on an image sensor (23). A liquid lens (722) is controlled (902) by feed-forward control to maintain said image stationary against vibration and/or scanning movement between the optical system and the target structure. In a second aspect, a liquid lens (1324, 1363) to correct chromatic aberration during measurements made at different wavelengths. This may improve focusing of the illumination on the target (T), and/or focusing of an image on the image sensor (23).