公开(公告)号：US12105432B2

公开(公告)日：2024-10-01

申请号：US17625640

申请日：2020-07-07

Applicant: ASML Netherlands B.V.

Inventor： Narjes Javaheri ,  Maurits Van Der Schaar ,  Tieh-Ming Chang ,  Hilko Dirk Bos ,  Patrick Warnaar ,  Samira Bahrami ,  Mohammadreza Hajiahmadi ,  Sergey Tarabrin ,  Mykhailo Semkiv

IPC: G03F7/00

CPC classification number: G03F7/70633

Abstract: Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.