公开(公告)号：US09971254B2

公开(公告)日：2018-05-15

申请号：US15694519

申请日：2017-09-01

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Haico Victor Kok ,  Yuri Johannes Gabriël Van De Vijver ,  Johannes Antonius Maria Van De Wal ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert-Jan Voogd ,  Jan Steven Christiaan Westerlaken ,  Johannes Hubertus Antonius Van De Rijdt ,  Allard Eelco Kooiker ,  Wilhelmina Margareta Jozef Hurkens-Mertens ,  Yohann Bruno Yvon Teillet

IPC: G03B27/52 ,  G03B27/58 ,  G03B27/74 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70858 ,  G03F7/70891

Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.