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公开(公告)号：US10534270B2
公开(公告)日：2020-01-14
申请号：US16269745
申请日：2019-02-07
发明人： Norbertus Josephus Martinus Van den Nieuwelaar , Victor Manuel Blanco Carballo , Casper Roderik De Groot , Rolf Hendrikus Jacobus Custers , David Merritt Phillips , Frederik Antonius Van der Zanden , Pieter Lein Joseph Gunter , Erik Henricus Egidius Catharina Eummelen , Yuri Johannes Gabriël Van de Vijver , Bert Dirk Scholten , Marijn Wouters , Ronald Frank Kox , Jorge Alberto Vieyra Salas
摘要： An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
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公开(公告)号：US10261422B2
公开(公告)日：2019-04-16
申请号：US15500866
申请日：2015-06-30
发明人： Norbertus Josephus Martinus Van Den Nieuwelaar , Victor Manuel Blanco Carballo , Casper Roderik De Groot , Rolf Hendrikus Jacobus Custers , David Merritt Phillips , Frederik Antonius Van Der Zanden , Pieter Lein Joseph Gunter , Erik Henricus Egidius Catharina Eummelen , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Marijn Wouters , Ronald Frank Kox , Jorge Alberto Vieyra Salas
摘要： An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
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