公开(公告)号：US10261422B2

公开(公告)日：2019-04-16

申请号：US15500866

申请日：2015-06-30

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus Van Den Nieuwelaar ,  Victor Manuel Blanco Carballo ,  Casper Roderik De Groot ,  Rolf Hendrikus Jacobus Custers ,  David Merritt Phillips ,  Frederik Antonius Van Der Zanden ,  Pieter Lein Joseph Gunter ,  Erik Henricus Egidius Catharina Eummelen ,  Yuri Johannes Gabriël Van De Vijver ,  Bert Dirk Scholten ,  Marijn Wouters ,  Ronald Frank Kox ,  Jorge Alberto Vieyra Salas

IPC: G03F7/20 ,  G02B27/00

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US10551748B2

公开(公告)日：2020-02-04

申请号：US15537214

申请日：2015-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria Rops ,  Walter Theodorus Matheus Stals ,  David Bessems ,  Giovanni Luca Gattobigio ,  Victor Manuel Blanco Carballo ,  Erik Henricus Egidius Catharina Eummelen ,  Ronald Van Der Ham ,  Frederik Antonius Van Der Zanden ,  Wilhelmus Antonius Wernaart

IPC: G03F7/20 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US10859919B2

公开(公告)日：2020-12-08

申请号：US16778635

申请日：2020-01-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria Rops ,  Walter Theodorus Matheus Stals ,  David Bessems ,  Giovanni Luca Gattobigio ,  Victor Manuel Blanco Carballo ,  Erik Henricus Egidius Catharina Eummelen ,  Ronald Van Der Ham ,  Frederik Antonius Van Der Zanden ,  Wilhelmus Antonius Wernaart

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.