公开(公告)号：US20240201486A1

公开(公告)日：2024-06-20

申请号：US18556801

申请日：2022-03-31

Applicant: ASML Netherlands B.V.

Inventor： Krishanu SHOME ,  Scott Douglas COSTON ,  Kan DU

IPC: G02B27/00 ,  G03F7/00 ,  G03F7/16

CPC classification number: G02B27/0025 ,  G03F7/168 ,  G03F7/70266 ,  G03F7/70325 ,  G03F7/706

Abstract: A method includes determining optical aberrations of an optical system, identifying an illumination profile that compensates for the optical aberrations of the optical system, and curing a layer of optical cement of an optical device using a modulated energy beam to achieve the identified illumination profile.

公开(公告)号：US20180329316A1

公开(公告)日：2018-11-15

申请号：US15756057

申请日：2016-08-23

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Alessandro POLO ,  Simon Gijsbert Josephus MATHIJSSEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Scott Douglas COSTON ,  Ronan James HAVELIN

IPC: G03F9/00 ,  G02B27/14 ,  G02B27/10 ,  G02B6/293

Abstract: A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target having a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components, each demultiplexing component operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.